Inventor · disambiguated record
Thomas Hecht
Also filed as: HECHT THOMAS · HECHT THOMAS COLUCCI
22 granted patents·16 pending applications·476 citations·filing 2002–2012
95Inventor score
Top patents by PatentIndex Score
38 records- 0197US7041568B2Method for the production of a self-adjusted structure on a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2002·Granted May 9, 2006·212 cites·8 claims
- 0296US6835417B2Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processesINFINEON TECHNOLOGIES AG·Filed 2003·Granted Dec 28, 2004·115 cites·13 claims
- 0391US7344953B2Process for vertically patterning substrates in semiconductor process technology by means of inconformal depositionINFINEON TECHNOLOGIES AG·Filed 2005·Granted Mar 18, 2008·19 cites·30 claims
- 0478US6693016B2Method of fabricating a trench-structure capacitor deviceINFINEON TECHNOLOGIES AG·Filed 2002·Granted Feb 17, 2004·21 cites·14 claims
- 0575US7297983B2Method for fabricating an integrated circuit on a semiconductor substrateINFINEON TECHNOLOGIES AG·Filed 2005·Granted Nov 20, 2007·6 cites·21 claims
- 0673US7307735B2Method for determining the depth of a buried structureINFINEON TECHNOLOGIES AG·Filed 2004·Granted Dec 11, 2007·16 cites·15 claims
- 0773US7132337B2Charge-trapping memory device and method of productionINFINEON TECHNOLOGIES AG·Filed 2004·Granted Nov 7, 2006·18 cites·18 claims
- 0873US6953722B2Method for patterning ceramic layersINFINEON TECHNOLOGIES AG·Filed 2003·Granted Oct 11, 2005·16 cites·11 claims
- 0971US6919255B2Semiconductor trench structureINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jul 19, 2005·16 cites·18 claims
- 1064US7157371B2Barrier layer and a method for suppressing diffusion processes during the production of semiconductor devicesINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jan 2, 2007·9 cites·15 claims
- 1164US6674113B2Trench capacitor and method for manufacturing the sameINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jan 6, 2004·9 cites·16 claims
- 1262US7842977B2Gate electrode structure, MOS field effect transistors and methods of manufacturing the sameQIMONDA AG·Filed 2007·Granted Nov 30, 2010·2 cites·22 claims
- 1361US7087485B2Method of fabricating an oxide collar for a trench capacitorINFINEON TECHNOLOGIES AG·Filed 2004·Granted Aug 8, 2006·7 cites·15 claims
- 1457US6821861B1Method for fabricating an electrode arrangement for charge storageINFINEON TECHNOLOGIES AG·Filed 2003·Granted Nov 23, 2004·6 cites·5 claims
- 1549US7176514B2Method and configuration for reinforcement of a dielectric layer at defects by self-aligning and self-limiting electrochemical conversion of a substrate materialINFINEON TECHNOLOGIES AG·Filed 2003·Granted Feb 13, 2007·2 cites·25 claims
- 1649US6806037B2Method for producing and/or renewing an etching maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Oct 19, 2004·2 cites·18 claims
- 1745US2004216670A1Process for the ALD coating of substrates and apparatus suitable for carrying out the processINFINEON TECHNOLOGIES AG·Filed 2004·Application pending·0 cites
- 1844US2012261468A1System and method for providing verification of age or other attributes in an alcohol serving environmentHECHT THOMAS COLUCCI·Filed 2012·Application pending·0 cites
- 1943US7268037B2Method for fabricating microchips using metal oxide masksINFINEON TECHNOLOGIES AG·Filed 2005·Granted Sep 11, 2007·0 cites·8 claims
- 2041US7531406B2Method for fabricating an electrical componentINFINEON TECHNOLOGIES AG·Filed 2006·Granted May 12, 2009·0 cites·32 claims
- 2141US7358187B2Coating process for patterned substrate surfacesINFINEON TECHNOLOGIES AG·Filed 2005·Granted Apr 15, 2008·0 cites·23 claims
- 2239US7402860B2Method for fabricating a capacitorINFINEON TECHNOLOGIES AG·Filed 2005·Granted Jul 22, 2008·0 cites·21 claims
- 2339US2008242097A1Selective deposition methodBOESCKE TIM·Filed 2007·Application pending·0 cites
- 2439US2006127576A1Method and process reactor for sequential gas phase deposition by means of a process and an auxiliatry chamberHECHT THOMAS·Filed 2003·Application pending·0 cites
- 2538US2005153507A1Fabrication method for a trench capacitor with an insulation collarINFINEON TECHNOLOGIES AG·Filed 2004·Application pending·0 cites
- 2638US2006264054A1Method for etching a trench in a semiconductor substrateGUTSCHE MARTIN U·Filed 2005·Application pending·0 cites
- 2738US2007210367A1Storage capacitor and method for producing such a storage capacitorQIMONDA AG·Filed 2006·Application pending·0 cites
- 2837US2006275981A1Memory and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2006·Application pending·0 cites
- 2937US2005127421A1Semiconductor module having an insulation layer and method for fabricating a semiconductor module having an insulation layerINFINEON TECHNOLOGIES AG·Filed 2003·Application pending·0 cites
- 3036US2007281432A1Transistor and method of providing interlocking strained silicon on a silicon substrateGOLDBACH MATTHIAS·Filed 2006·Application pending·0 cites
- 3135US7144770B2Memory cell and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2004·Granted Dec 5, 2006·0 cites·22 claims
- 3235US6960524B2Method for production of a metallic or metal-containing layerINFINEON TECHNOLOGIES AG·Filed 2003·Granted Nov 1, 2005·0 cites·9 claims
- 3335US2003114018A1Method for fabricating a semiconductor componentFiled 2002·Application pending·0 cites
- 3435US2008009139A1Structure in a substrate for the manufacturing of a semiconductor device and process for manufacturing of a semiconductor deviceHECHT THOMAS·Filed 2006·Application pending·0 cites
- 3535US2008182344A1Method and system for determining deformations on a substrateMUELLER STEFFEN·Filed 2007·Application pending·0 cites
- 3634US2003060003A1Capacitor device for a semiconductor circuit configuration, and fabrication methodFiled 2002·Application pending·0 cites
- 3733US2007111547A1Method for producing a semiconductor structureHECHT THOMAS·Filed 2006·Application pending·0 cites
- 3830US2006202250A1Storage capacitor, array of storage capacitors and memory cell arrayHECHT THOMAS·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →