Inventor · disambiguated record
Thomas R. Pampalone
Also filed as: PAMPALONE THOMAS R
19 granted patents·344 citations·filing 1979–1991
95Inventor score
Top patents by PatentIndex Score
19 records- 0192US4550069APositive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetateHOECHST CO AMERICAN·Filed 1984·Granted Oct 29, 1985·61 cites·11 claims
- 0282US4609614AProcess of using absorptive layer in optical lithography with overlying photoresist layer to form relief pattern on substrateRCA CORP·Filed 1985·Granted Sep 2, 1986·44 cites·6 claims
- 0376US4357369AMethod of plasma etching a substrateRCA CORP·Filed 1981·Granted Nov 2, 1982·41 cites·11 claims
- 0464US4355094APositive radiation sensitive resist terpolymersRCA CORP·Filed 1981·Granted Oct 19, 1982·17 cites·8 claims
- 0563US4398660AMethod of mounting electronic componentsRCA CORP·Filed 1981·Granted Aug 16, 1983·21 cites·9 claims
- 0662US4612270ATwo-layer negative resistRCA CORP·Filed 1985·Granted Sep 16, 1986·18 cites·19 claims
- 0761US4810619APhotolithography over reflective substrates comprising a titanium nitride layerGEN ELECTRIC·Filed 1987·Granted Mar 7, 1989·15 cites·13 claims
- 0860US4263385AMethod for the manufacture of multi-color microlithographic displaysRCA CORP·Filed 1980·Granted Apr 21, 1981·15 cites·11 claims
- 0959US4621042AAbsorptive planarizing layer for optical lithographyRCA CORP·Filed 1985·Granted Nov 4, 1986·23 cites·10 claims
- 1058US5066561AMethod for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetateHOECHST CELANESE CORP·Filed 1990·Granted Nov 19, 1991·15 cites·20 claims
- 1155US4341861AAqueous developable poly(olefin sulfone) terpolymersRCA CORP·Filed 1980·Granted Jul 27, 1982·12 cites·8 claims
- 1252US4405776APositive radiation sensitive resist terpolymer from omega alkynoic acidRCA CORP·Filed 1982·Granted Sep 20, 1983·9 cites·4 claims
- 1352US4393160AAqueous developable poly(olefin sulfone) terpolymersRCA CORP·Filed 1982·Granted Jul 12, 1983·10 cites·7 claims
- 1452US4262073APositive resist medium and method of employing sameRCA CORP·Filed 1979·Granted Apr 14, 1981·12 cites·10 claims
- 1551US4389433ASulfur dioxide cured coatingsRCA CORP·Filed 1981·Granted Jun 21, 1983·10 cites·14 claims
- 1645US5143814APositive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetateHOECHST CELANESE CORP·Filed 1991·Granted Sep 1, 1992·7 cites·24 claims
- 1744US4262083APositive resist for electron beam and x-ray lithography and method of using sameRCA CORP·Filed 1979·Granted Apr 14, 1981·7 cites·8 claims
- 1833US4330671APositive resist for electron beam and x-ray lithography and method of using sameRCA CORP·Filed 1980·Granted May 18, 1982·3 cites·8 claims
- 1932US4401775AEpoxy encapsulating formulationRCA CORP·Filed 1982·Granted Aug 30, 1983·4 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →