Inventor · disambiguated record
Thomas Stettner
Also filed as: STETTNER THOMAS
1 granted patent·5 pending applications·0 citations·filing 2021–2022
8Inventor score
Technology areasH10P
Files withSILTRONIC AG6
Top patents by PatentIndex Score
6 records- 0137US12331424B2Method for depositing an epitaxial layer on a substrate waferSILTRONIC AG·Filed 2021·Granted Jun 17, 2025·0 cites·20 claims
- 0233US2024218558A1Method for depositing an epitaxial layer on a substrate wafer made of semiconductor material in a deposition deviceSILTRONIC AG·Filed 2022·Application pending·0 cites
- 0333US2024186168A1Process for manufacturing semiconductor wafers containing a gas-phase epitaxial layer in a deposition chamberSILTRONIC AG·Filed 2022·Application pending·0 cites
- 0433US2024117523A1Process for manufacturing semiconductor wafers containing a gas-phase epitaxial layer in a deposition chamberSILTRONIC AG·Filed 2022·Application pending·0 cites
- 0531US2023178398A1Method and device for depositing an epitaxial layer on a substrate wafer made of semiconductor materialSILTRONIC AG·Filed 2021·Application pending·0 cites
- 0631US2023366095A1Method and device for depositing an epitaxial layer on a substrate wafer made of semiconductor materialSILTRONIC AG·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →