Inventor · disambiguated record
Ting-Kai Huang
Also filed as: HUANG TING-KAI
11 granted patents·16 pending applications·2 citations·filing 1999–2025
80Inventor score
Files withFUJIFILM ELECTRONIC MAT USA INC14SUNKO INK CO LTD7HUANG TING-KAI2HUGA OPTOTECH INC1KUO CHING CHEMICAL CO LTD1
Top patents by PatentIndex Score
27 records- 0182US11414568B2Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Aug 16, 2022·1 cites·20 claims
- 0275US2025333622A1Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2025·Application pending·0 cites
- 0371US2024141205A1Compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2024·Application pending·0 cites
- 0469US11851585B2Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted Dec 26, 2023·0 cites·19 claims
- 0568US2019059516A1Microwave molded article and method thereofSUNKO INK CO LTD·Filed 2018·Application pending·0 cites
- 0665US2023052829A1Compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Application pending·0 cites
- 0765US2025172520A1Detection device and method for operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 0863US11505718B2Barrier ruthenium chemical mechanical polishing slurryFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Nov 22, 2022·0 cites·25 claims
- 0962US12371589B2Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Jul 29, 2025·0 cites·21 claims
- 1062US11999876B2Bulk ruthenium chemical mechanical polishing compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Granted Jun 4, 2024·0 cites·10 claims
- 1162US2024327675A1Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2024·Application pending·0 cites
- 1261US2017073490A1Foamed thermoplastic polyurethane and microwave molded article thereofSUNKO INK CO LTD·Filed 2016·Application pending·0 cites
- 1358US2024174892A1Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2023·Application pending·0 cites
- 1455US11034859B2Barrier ruthenium chemical mechanical polishing slurryFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Jun 15, 2021·0 cites·32 claims
- 1554US11279850B2Bulk ruthenium chemical mechanical polishing compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2019·Granted Mar 22, 2022·0 cites·20 claims
- 1652US11993689B2Foamed thermoplastic polyurethane and microwave molded body thereofSUNKO INK CO LTD·Filed 2018·Granted May 28, 2024·0 cites·18 claims
- 1752US2023135325A1Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2022·Application pending·0 cites
- 1848US2017072599A1Microwave molded article and method thereofSUNKO INK CO LTD·Filed 2016·Application pending·0 cites
- 1947US12398291B2Polishing compositions and methods of use thereofFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Aug 26, 2025·0 cites·21 claims
- 2045US2015267045A1Polymeric composite material and method of preparing the sameSUNKO INK CO LTD·Filed 2014·Application pending·0 cites
- 2144US2015252187A1Multifunctional environmentally protective polyurethane composite material and method of making the sameSUNKO INK CO LTD·Filed 2014·Application pending·0 cites
- 2243US2013165562A1Phosphorous flame retardant containing clayLIN JIANG-JEN·Filed 2012·Application pending·0 cites
- 2342US7737453B2Light emitting diode structureHUGA OPTOTECH INC·Filed 2007·Granted Jun 15, 2010·0 cites·9 claims
- 2442US2015257473A1Integrated shoe and method of making the sameSUNKO INK CO LTD·Filed 2014·Application pending·0 cites
- 2532US2005274958A1Buffer layer of light emitting semiconducting deviceHUANG TING-KAI·Filed 2004·Application pending·0 cites
- 2632US2005274964A1Light emitting diode structureHUANG TING-KAI·Filed 2004·Application pending·0 cites
- 2726US6087504AProcess for the preparation of 1,1'-dialkyl-4,4'-bipyridinium salt compoundsKUO CHING CHEMICAL CO LTD·Filed 1999·Granted Jul 11, 2000·1 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →