Inventor · disambiguated record
Tomoyuki Ando
Also filed as: ANDO TOMOYUKI
29 granted patents·13 pending applications·149 citations·filing 1994–2017
95Inventor score
Files withMITSUI CHEMICALS INC10TOKYO OHKA KOGYO CO LTD10ANDO TOMOYUKI6MURAKAMI MASAKAZU4IBIDEN CO LTD3
Top patents by PatentIndex Score
42 records- 0197US8426551B2Metal thietane compound, polymerizable composition containing the compound, resin and use of the resinMURAKAMI MASAKAZU·Filed 2012·Granted Apr 23, 2013·23 cites·34 claims
- 0288US7799883B2Norbornene-type polymers, compositions thereof and lithographic process using such compositionsPROMERUS LLC·Filed 2006·Granted Sep 21, 2010·10 cites·23 claims
- 0383US8263322B2Method of forming resist patternANDO TOMOYUKI·Filed 2009·Granted Sep 11, 2012·7 cites·4 claims
- 0482US8420718B2Composition, polymerizable composition, resin, optical component, and method for producing the compositionANDO TOMOYUKI·Filed 2009·Granted Apr 16, 2013·5 cites·16 claims
- 0582US8236483B2Method of forming resist patternANDO TOMOYUKI·Filed 2009·Granted Aug 7, 2012·7 cites·8 claims
- 0680US6320078B1Method of producing benzamide derivativesMITSUI CHEMICALS INC·Filed 1999·Granted Nov 20, 2001·22 cites·11 claims
- 0779US7318992B2Lift-off positive resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jan 15, 2008·6 cites·12 claims
- 0877US8293864B2Metal thietane compound, polymerizable composition containing the compound, resin and use of the resinMURAKAMI MASAKAZU·Filed 2008·Granted Oct 23, 2012·3 cites·17 claims
- 0977US7125704B2Gluconate dehydrataseMITSUI CHEMICALS INC·Filed 2004·Granted Oct 24, 2006·5 cites·2 claims
- 1076US7510861B2Gluconate dehydrataseMITSUI CHEMICALS INC·Filed 2006·Granted Mar 31, 2009·2 cites·12 claims
- 1173US8329838B2Norbornene-type polymers, compositions thereof and lithographic processes using such compositionsRHODES LARRY F·Filed 2010·Granted Dec 11, 2012·2 cites·18 claims
- 1270US7687221B2Positive resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Mar 30, 2010·4 cites·11 claims
- 1366US7749677B2Negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jul 6, 2010·2 cites·6 claims
- 1465US8957341B2Gas circuit breakerHITACHI LTD·Filed 2012·Granted Feb 17, 2015·2 cites·3 claims
- 1565US5877478ASemiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 1994·Granted Mar 2, 1999·36 cites·9 claims
- 1662US8349996B2Compound, polymerizable composition, resin, and use of the composition and the resinMITSUI CHEMICALS INC·Filed 2009·Granted Jan 8, 2013·2 cites·16 claims
- 1761US8680295B2Process for producing bis(thietanylthio)dithiastannolaneMURAKAMI MASAKAZU·Filed 2012·Granted Mar 25, 2014·0 cites·2 claims
- 1860US9244354B2Method for producing thick film photoresist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Jan 26, 2016·1 cites·5 claims
- 1958US8697889B2Metal compound, polymerizable composition containing the same, resin, method for producing the resin, and use of the resinMURAKAMI MASAKAZU·Filed 2009·Granted Apr 15, 2014·0 cites·12 claims
- 2054US11491772B2Substrate bonding method and laminated body production methodTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Nov 8, 2022·0 cites·9 claims
- 2149US10472435B2Polymerizable composition and novel alkyne compoundMITSUI CHEMICALS INC·Filed 2016·Granted Nov 12, 2019·0 cites·7 claims
- 2249US2010280208A1Thietane compound, polymerizable composition comprising the compound, and use of the compositionMITSUI CHEMICALS INC·Filed 2008·Application pending·0 cites
- 2348US2009211518A1Crucible holding member and method for producing the sameIBIDEN CO LTD·Filed 2009·Application pending·0 cites
- 2448US2004254368A1Production of aldosesMITSUI CHEMICALS INC·Filed 2004·Application pending·0 cites
- 2548US2006094869A1Selective process for producing an anomer of a 1-phosphorylated saccharide derivative and process for producing a nucleosideMITSUI CHEMICALS INC·Filed 2005·Application pending·0 cites
- 2648US2009214808A1Container holding member and method for producing the sameIBIDEN CO LTD·Filed 2009·Application pending·0 cites
- 2747US2009211517A1Crucible holding member and method for producing the sameIBIDEN CO LTD·Filed 2009·Application pending·0 cites
- 2847US2006069289A1Process for production 2-deoxyaldose compoundMITSUI CHEMICALS INC·Filed 2003·Application pending·0 cites
- 2946US8815365B2Carbon fiber structure and method for manufacturing the sameKATO HIDEKI·Filed 2011·Granted Aug 26, 2014·0 cites·15 claims
- 3046US8394891B2Additive for polymerizable composition, polymerizable composition containing the same and use of the polymerizable compositionANDO TOMOYUKI·Filed 2008·Granted Mar 12, 2013·0 cites·23 claims
- 3145US7038039B2Process for selectively producing 1-phosphorylated sugar derivative anomer and process for producing nucleosideMITSUI CHEMICALS INC·Filed 2001·Granted May 2, 2006·0 cites·26 claims
- 3241US2006235174A1Norbornene-type polymers, compositions thereof and lithographic processes using such compositionsTOKYO OHKA KOGYO CO LTD·Filed 2006·Application pending·0 cites
- 3340US8062825B2Positive resist composition and resist pattern forming methodANDO TOMOYUKI·Filed 2005·Granted Nov 22, 2011·0 cites·9 claims
- 3439US11415888B2Negative type photosensitive resin composition, photosensitive resist film, pattern forming method, cured film, and method of producing cured filmTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Aug 16, 2022·0 cites·13 claims
- 3539US5473188ASemiconductor device of the LOC structure type having a flexible wiring patternTOSHIBA KK·Filed 1994·Granted Dec 5, 1995·10 cites·18 claims
- 3639US2012141940A1Chemically amplified positive-type photoresist composition for thick film, and method for producing thick film resist patternSHIMIZU TAKAHIRO·Filed 2011·Application pending·0 cites
- 3738US10241403B2Negative photosensitive composition and pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Mar 26, 2019·0 cites·4 claims
- 3837US2007009828A1Positive resist composition, resist laminates and process for forming resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 3937US2006240355A1Positive resist composition and resist laminate for low-acceleration electron beam and mehod of pattern formationANDO TOMOYUKI·Filed 2004·Application pending·0 cites
- 4036US2012034401A1C/c composite material molded body and method for manufacturing the sameKATO HIDEKI·Filed 2011·Application pending·0 cites
- 4135US2012034400A1Carbon fiber-reinforced carbon composite material and method for manufacturing the sameKATO HIDEKI·Filed 2011·Application pending·0 cites
- 4228US7727701B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jun 1, 2010·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →