Inventor · disambiguated record
Todd W. Buley
Also filed as: BULEY TODD W
7 granted patents·380 citations·filing 1993–2002
89Inventor score
Top patents by PatentIndex Score
7 records- 0195US6632127B1Fixed abrasive planarization pad conditioner incorporating chemical vapor deposited polycrystalline diamond and method for making sameFiled 2002·Granted Oct 14, 2003·71 cites·5 claims
- 0293US5246881ALow-pressure chemical vapor deposition process for depositing high-density, highly-conformal, titanium nitride films of low bulk resistivityMICRON SEMICONDUCTOR INC·Filed 1993·Granted Sep 21, 1993·151 cites·22 claims
- 0386US6149508AChemical mechanical planarization systemMOTOROLA INC·Filed 1999·Granted Nov 21, 2000·62 cites·20 claims
- 0485US5945346AChemical mechanical planarization system and method thereforMOTOROLA INC·Filed 1997·Granted Aug 31, 1999·60 cites·15 claims
- 0557USRE35785ELow-pressure chemical vapor deposition process for depositing high-density highly-conformal, titanium nitride films of low bulk resistivityMICRON TECHNOLOGY INC·Filed 1995·Granted May 5, 1998·20 cites·23 claims
- 0649US5464031AMethod of chamber cleaning in MOCVD applicationsMICRON SEMICONDUCTOR INC·Filed 1993·Granted Nov 7, 1995·11 cites·6 claims
- 0738US5658391AMethod of chamber cleaning in MOCVD applicationMICRON TECHNOLOGY INC·Filed 1995·Granted Aug 19, 1997·5 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →