Inventor · disambiguated record
Toshitsura Cho
Also filed as: CHO TOSHITSURA
11 granted patents·4 pending applications·194 citations·filing 1986–2011
91Inventor score
Top patents by PatentIndex Score
15 records- 0189US4634509AMethod for production of aqueous quaternary ammonium hydroxide solutionTAMA CHEMICAL CO LTD·Filed 1986·Granted Jan 6, 1987·56 cites·5 claims
- 0285US5534649AProcess for preparing dialkyl carbonatesTAMA CHEMICALS CO LTD·Filed 1994·Granted Jul 9, 1996·26 cites·4 claims
- 0375US4892625AMethod for producing high purity chemicalsTAMA CHEMICALS CO LTD·Filed 1987·Granted Jan 9, 1990·14 cites·4 claims
- 0467US6426294B1Copper-based metal polishing composition, method for manufacturing a semiconductor device, polishing composition, aluminum-based metal polishing composition, and tungsten-based metal polishing compositionTOSHIBA KK·Filed 1999·Granted Jul 30, 2002·29 cites·21 claims
- 0566US6861010B2Copper-based metal polishing composition, method for manufacturing a semiconductor device, polishing composition, aluminum-based metal polishing composition, and tungsten-based metal polishing compositionTOSHIBA KK·Filed 2002·Granted Mar 1, 2005·9 cites·7 claims
- 0662US8206573B2Electrode for electrolysis and method for producing aqueous solution of quaternary ammonium hydroxide using the sameOHTA YOSHIRO·Filed 2005·Granted Jun 26, 2012·1 cites·7 claims
- 0758US5545309AMethod of processing organic quaternary ammonium hydroxide-containing waste liquidTAMA CHEMICALS CO LTD·Filed 1995·Granted Aug 13, 1996·18 cites·20 claims
- 0857US5439564AMethod of processing organic quaternary ammonium hydroxide-containing waste liquidTAMA CHEMICALS CO LTD·Filed 1993·Granted Aug 8, 1995·19 cites·5 claims
- 0947US5783609AProcess for recovering organoalkoxysilane from polyorganosiloxaneTAMA CHEMICALS CO LTD·Filed 1994·Granted Jul 21, 1998·7 cites·33 claims
- 1047US2009317624A1Uniformly dispersed photocatalyst coating liquid, method for producing same, and photocatalytically active composite material obtained by using sameYOSHIOKA KEN·Filed 2007·Application pending·0 cites
- 1143US2007094936A1Abrasive slurry having high dispersion stability and manufacturing method for a substrateTAMA CHEMICALS CO LTD·Filed 2006·Application pending·0 cites
- 1240US4806329AMethod of producing granular synthetic silicaTAMA CHEMICALS CO LTD·Filed 1986·Granted Feb 21, 1989·5 cites·6 claims
- 1338US2013174868A1Method for purifying alkaline treatment fluid for semiconductor substrate and a purification apparatusMURAOKA HISASHI·Filed 2011·Application pending·0 cites
- 1436US6315644B1Apparatus and process for supplying abrasives for use in the manufacture of semiconductorsTAMA CHEMICALS CO LTD·Filed 1999·Granted Nov 13, 2001·10 cites·13 claims
- 1533US2004221516A1Abrasive slurry having high dispersion stability and manufacturing method for a substrateFiled 2004·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Toshitsura Cho files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →