Inventor · disambiguated record
Tomoharu Hase
Also filed as: HASE TOMOHARU
11 granted patents·1 pending application·144 citations·filing 1998–2009
90Inventor score
Files withCANON KK12
Top patents by PatentIndex Score
12 records- 0193US6252648B1Exposure apparatus and method of cleaning optical element of the sameCANON KK·Filed 1999·Granted Jun 26, 2001·91 cites·16 claims
- 0281US6999159B2Exposure apparatus and device manufacturing method including gas purging of a space containing optical componentsCANON KK·Filed 2005·Granted Feb 14, 2006·4 cites·2 claims
- 0381US6630985B2Exposure apparatus and device manufacturing method including gas purging of a space containing optical componentsCANON KK·Filed 2002·Granted Oct 7, 2003·14 cites·20 claims
- 0475US7119878B2Exposure apparatus and method of cleaning optical element of the sameCANON KK·Filed 2005·Granted Oct 10, 2006·3 cites·9 claims
- 0573US7236239B2Illumination system and exposure apparatusCANON KK·Filed 2004·Granted Jun 26, 2007·13 cites·7 claims
- 0666US6552774B2Exposure apparatusCANON KK·Filed 2000·Granted Apr 22, 2003·8 cites·25 claims
- 0753US6853439B1Exposure apparatus and device manufacturing method including gas purging of a space containing optical componentsCANON KK·Filed 1998·Granted Feb 8, 2005·9 cites·6 claims
- 0852US7116397B2Exposure apparatus and device manufacturing methodCANON KK·Filed 2005·Granted Oct 3, 2006·0 cites·3 claims
- 0948US7061576B2Exposure apparatus and method of cleaning optical element of the sameCANON KK·Filed 2001·Granted Jun 13, 2006·1 cites·11 claims
- 1046US7251014B2Exposing method, exposing apparatus and device manufacturing method utilizing themCANON KK·Filed 2004·Granted Jul 31, 2007·1 cites·19 claims
- 1146US2009185150A1Immersion exposure apparatus and device manufacturing methodCANON KK·Filed 2009·Application pending·0 cites
- 1244US6967706B2Exposure apparatus and device manufacturing method including gas purging of a space containing optical componentsCANON KK·Filed 2004·Granted Nov 22, 2005·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →