Inventor · disambiguated record
Toshitaka Hiraga
Also filed as: HIRAGA TOSHITAKA
5 granted patents·2 pending applications·119 citations·filing 2002–2008
81Inventor score
Technology areasH10P
Top patents by PatentIndex Score
7 records- 0188US7718590B2Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric materialEKC TECHNOLOGY INC·Filed 2006·Granted May 18, 2010·19 cites·11 claims
- 0288US7250391B2Cleaning composition for removing resists and method of manufacturing semiconductor deviceEKC TECHNOLOGY K K·Filed 2003·Granted Jul 31, 2007·56 cites·9 claims
- 0387US7399365B2Aqueous fluoride compositions for cleaning semiconductor devicesEKC TECHNOLOGY INC·Filed 2004·Granted Jul 15, 2008·35 cites·4 claims
- 0461US7087563B2Resist stripping composition and method of producing semiconductor device using the sameEKC TECHNOLOGY K K·Filed 2002·Granted Aug 8, 2006·9 cites·11 claims
- 0553US2009099051A1Aqueous fluoride compositions for cleaning semiconductor devicesEKC TECHNOLOGY INC·Filed 2008·Application pending·0 cites
- 0650US2008076260A1Separation-material composition for photo-resist and manufacturing method of semiconductor deviceSONY CORP·Filed 2007·Application pending·0 cites
- 0740US7341827B2Separation-material composition for photo-resist and manufacturing method of semiconductor deviceSONY CORP·Filed 2003·Granted Mar 11, 2008·0 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →