Inventor · disambiguated record
Tomoyuki Hirano
Also filed as: HIRANO TOMOYUKI
96 granted patents·23 pending applications·690 citations·filing 1977–2024
99Inventor score
Files withSONY CORP26TOKYO OHKA KOGYO CO LTD25HIRANO TOMOYUKI13SONY SEMICONDUCTOR SOLUTIONS CORP9DAZAI TAKAHIRO6
Top patents by PatentIndex Score
119 records- 0197US4272114AImpact absorbing deviceMITSUBISHI MOTORS CORP·Filed 1979·Granted Jun 9, 1981·158 cites·11 claims
- 0297US4190276ADeformable impact absorbing device for vehiclesMITSUBISHI MOTORS CORP·Filed 1977·Granted Feb 26, 1980·130 cites·15 claims
- 0396US10044918B2Solid-state imaging device having an anti-reflection feature and method for manufacturing the sameSONY CORP·Filed 2017·Granted Aug 7, 2018·9 cites·40 claims
- 0496US9819846B2Solid-state imaging device having a moth-eye structure and light blocking portions, method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2014·Granted Nov 14, 2017·17 cites·18 claims
- 0595US11570387B2Solid-state imaging device with uneven structures and method for manufacturing the same, and electronic apparatusSONY GROUP CORP·Filed 2022·Granted Jan 31, 2023·2 cites·16 claims
- 0695US10700114B2Solid-state imaging element, method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2017·Granted Jun 30, 2020·12 cites·21 claims
- 0794US11094725B2Solid-state imaging device, method of manufacturing the same, and electronic apparatusSONY CORP·Filed 2018·Granted Aug 17, 2021·4 cites·17 claims
- 0894US8192915B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted Jun 5, 2012·21 cites·14 claims
- 0993US11171167B2Solid-state imaging apparatus and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2018·Granted Nov 9, 2021·4 cites·20 claims
- 1093US8221956B2Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compoundSHIONO DAIJU·Filed 2009·Granted Jul 17, 2012·20 cites·9 claims
- 1192US11127771B2Solid-state imaging device, method of manufacturing the same, and electronic apparatusSONY CORP·Filed 2018·Granted Sep 21, 2021·3 cites·11 claims
- 1292US10771664B2Solid-state imaging device with uneven structures and the method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2019·Granted Sep 8, 2020·4 cites·17 claims
- 1392US10412287B2Solid-state imaging device and method for manufacturing electronic apparatusSONY CORP·Filed 2019·Granted Sep 10, 2019·4 cites·18 claims
- 1491US11277578B2Solid-state imaging device with uneven structures and method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2020·Granted Mar 15, 2022·2 cites·19 claims
- 1591US8394578B2Method of forming resist pattern and negative tone-development resist compositionHIRANO TOMOYUKI·Filed 2011·Granted Mar 12, 2013·9 cites·3 claims
- 1691US8227170B2Resist composition, method of forming resist pattern, polymeric compound, and compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 24, 2012·11 cites·20 claims
- 1790US11076078B2Solid-state imaging device with uneven structures and method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2020·Granted Jul 27, 2021·2 cites·20 claims
- 1890US9164379B2Resist composition, method for forming resist pattern, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Oct 20, 2015·6 cites·12 claims
- 1990US8329378B2Positive resist composition, method of forming resist pattern, and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted Dec 11, 2012·9 cites·12 claims
- 2090US8268529B2Positive resist composition, method of forming resist pattern using the same, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Sep 18, 2012·9 cites·11 claims
- 2190US8182976B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2009·Granted May 22, 2012·13 cites·16 claims
- 2289US11398515B2Solid-state imaging element, method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2020·Granted Jul 26, 2022·2 cites·20 claims
- 2389US9341947B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted May 17, 2016·4 cites·20 claims
- 2488US11476285B2Light-receiving device, imaging device, and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2017·Granted Oct 18, 2022·4 cites·18 claims
- 2588US6561876B1CMP method and semiconductor manufacturing apparatusTOSHIBA KK·Filed 2000·Granted May 13, 2003·43 cites·21 claims
- 2687US8440385B2Positive resist composition, method of forming resist pattern and polymeric compoundHIRANO TOMOYUKI·Filed 2010·Granted May 14, 2013·5 cites·16 claims
- 2787US8206891B2Positive resist composition and method of forming resist patternSESHIMO TAKEHIRO·Filed 2009·Granted Jun 26, 2012·10 cites·6 claims
- 2886US10326920B2Solid-state imaging device and method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2018·Granted Jun 18, 2019·2 cites·41 claims
- 2985US9696625B2Method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Jul 4, 2017·6 cites·21 claims
- 3085US8236477B2Positive resist composition and method of forming resist patternMATSUMIYA TASUKU·Filed 2009·Granted Aug 7, 2012·7 cites·8 claims
- 3184US8795947B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 5, 2014·4 cites·2 claims
- 3282US12364044B2Solid-state imaging apparatus and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2023·Granted Jul 15, 2025·0 cites·20 claims
- 3382US8541529B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2012·Granted Sep 24, 2013·3 cites·6 claims
- 3482US7968365B2Method for manufacturing solid-state imaging deviceSONY CORP·Filed 2009·Granted Jun 28, 2011·6 cites·13 claims
- 3581US10855893B2Solid-state imaging device with uneven structures and method for manufacturing the same, and electronic apparatusSONY CORP·Filed 2020·Granted Dec 1, 2020·1 cites·24 claims
- 3681US8927191B2Resist composition, method of forming resist pattern and polymeric compoundTSUCHIYA JUNICHI·Filed 2012·Granted Jan 6, 2015·5 cites·9 claims
- 3781US8404428B2Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compoundMATSUMIYA TASUKU·Filed 2010·Granted Mar 26, 2013·3 cites·7 claims
- 3880US12100722B2Imaging device with improved short-wavelength sensitivitySONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2019·Granted Sep 24, 2024·1 cites·12 claims
- 3980US8642244B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2011·Granted Feb 4, 2014·3 cites·7 claims
- 4080US8232041B2Positive resist composition, method of forming resist pattern, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Jul 31, 2012·12 cites·10 claims
- 4180US7994603B2Semiconductor device and a method of manufacturing the sameSONY CORP·Filed 2008·Granted Aug 9, 2011·7 cites·1 claims
- 4278US8866251B2Solid-state imaging element having optical waveguide with insulating layerHIRANO TOMOYUKI·Filed 2009·Granted Oct 21, 2014·4 cites·8 claims
- 4378US8846838B2Fluorine-containing block copolymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Sep 30, 2014·2 cites·1 claims
- 4476US8475997B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compoundSHIONO DAIJU·Filed 2011·Granted Jul 2, 2013·2 cites·17 claims
- 4576US8088553B2Positive resist composition, method of forming resist pattern, and polymeric compoundSHIMIZU HIROAKI·Filed 2009·Granted Jan 3, 2012·4 cites·8 claims
- 4675US10332921B2Solid-state image sensing device and method for manufacturing the same, and electronic deviceSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2016·Granted Jun 25, 2019·2 cites·14 claims
- 4774US11948958B2Solid-state imaging element, method for manufacturing the same, and electronic apparatusSONY GROUP CORP·Filed 2022·Granted Apr 2, 2024·0 cites·20 claims
- 4874US8937363B2Solid-state imaging device and electronic apparatusNAKAZAWA MASASHI·Filed 2012·Granted Jan 20, 2015·1 cites·17 claims
- 4973US11888008B2Solid-state imaging apparatus and electronic apparatusSONY SEMICONDUCTOR SOLUTIONS CORP·Filed 2021·Granted Jan 30, 2024·0 cites·12 claims
- 5073US8980524B2Positive resist composition and method of forming resist patternHIRANO TOMOYUKI·Filed 2010·Granted Mar 17, 2015·2 cites·10 claims
Showing the top 50 of 119 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →