Inventor · disambiguated record
Tomoyuki Imada
Also filed as: IMADA TOMOYUKI
28 granted patents·14 pending applications·93 citations·filing 2002–2023
94Inventor score
Top patents by PatentIndex Score
42 records- 0195US6784228B2Epoxy resin composition, cured article thereof, novel epoxy resin, novel phenol compound, and process for preparing the sameDAINIPPON INK & CHEMICALS·Filed 2002·Granted Aug 31, 2004·51 cites·18 claims
- 0292US10466590B2Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coatingDAINIPPON INK & CHEMICALS·Filed 2015·Granted Nov 5, 2019·5 cites·5 claims
- 0388US9828457B2Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer filmDAINIPPON INK & CHEMICALS·Filed 2014·Granted Nov 28, 2017·5 cites·12 claims
- 0485US9975830B2Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating filmDAINIPPON INK & CHEMICALS·Filed 2015·Granted May 22, 2018·3 cites·4 claims
- 0584US9765175B2Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coatingDAINIPPON INK & CHEMICALS·Filed 2014·Granted Sep 19, 2017·4 cites·8 claims
- 0680US10414850B2Resin containing phenolic hydroxyl groups, and resist filmDAINIPPON INK & CHEMICALS·Filed 2016·Granted Sep 17, 2019·2 cites·5 claims
- 0778US9550723B2Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material compositionDAINIPPON INK & CHEMICALS·Filed 2016·Granted Jan 24, 2017·1 cites·12 claims
- 0877US10047186B2Novolac phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating filmDAINIPPON INK & CHEMICALS·Filed 2015·Granted Aug 14, 2018·1 cites·9 claims
- 0977US7456247B2Phenolic resin formed from a difunctional phenol and a divinyl etherDAINIPPON INK & CHEMICALS·Filed 2006·Granted Nov 25, 2008·2 cites·2 claims
- 1076US2025037804A1Method of searching for thermosetting epoxy resin composition, information processor, and programDAINIPPON INK & CHEMICALS·Filed 2023·Application pending·0 cites
- 1175US7087702B2Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resinDAINIPPON INK & CHEMICALS·Filed 2003·Granted Aug 8, 2006·9 cites·3 claims
- 1271US10179828B2Curable composition for permanent resist films, and permanent resist filmDAINIPPON INK & CHEMICALS·Filed 2015·Granted Jan 15, 2019·1 cites·19 claims
- 1369US8846297B2Positive photoresist composition, coating film thereof, and novolac phenol resinIMADA TOMOYUKI·Filed 2012·Granted Sep 30, 2014·2 cites·20 claims
- 1469US8623585B2Positive-type photoresist compositionIMADA TOMOYUKI·Filed 2011·Granted Jan 7, 2014·2 cites·8 claims
- 1568US9441344B2Controller assembly, cab for work machine, and work machineKOMATSU MFG CO LTD·Filed 2013·Granted Sep 13, 2016·4 cites·5 claims
- 1664US10266471B2Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the compositionDAINIPPON INK & CHEMICALS·Filed 2015·Granted Apr 23, 2019·1 cites·10 claims
- 1761US2025022546A1Method of searching for thermosetting epoxy resin composition, information processor, and programDAINIPPON INK & CHEMICALS·Filed 2023·Application pending·0 cites
- 1859US9469592B2Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material compositionDAINIPPON INK & CHEMICALS·Filed 2013·Granted Oct 18, 2016·0 cites·20 claims
- 1959US2024270891A1Phenolic hydroxy group-containing resin, resin composition for alkaline developable resist, resist curable resin composition, and method for producing phenolic hydroxy group-containing resinDAINIPPON INK & CHEMICALS·Filed 2021·Application pending·0 cites
- 2059US2024086733A1Method for searching for novolac phenol resin, information processing device, and non-transitory computer-readable recording mediumDAINIPPON INK & CHEMICALS·Filed 2022·Application pending·0 cites
- 2158US7569654B2Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resinDAINIPPON INK & CHEMICALS·Filed 2006·Granted Aug 4, 2009·0 cites·8 claims
- 2258US7365147B2Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resinDAINIPPON INK & CHEMICALS·Filed 2006·Granted Apr 29, 2008·0 cites·2 claims
- 2350US11487204B2Resist materialDAINIPPON INK & CHEMICALS·Filed 2018·Granted Nov 1, 2022·0 cites·12 claims
- 2449US8816033B2Radically curable compound, cured product thereof, and method for producing the compoundIMADA TOMOYUKI·Filed 2012·Granted Aug 26, 2014·0 cites·10 claims
- 2548US11472763B2Calixarene compound, curable composition, and cured productDAINIPPON INK & CHEMICALS·Filed 2018·Granted Oct 18, 2022·0 cites·8 claims
- 2648US2023159707A1Coating composition for producing interlayer insulation film, interlayer insulation film, semiconductor element, and method for producing interlayer insulation filmDAINIPPON INK & CHEMICALS·Filed 2021·Application pending·0 cites
- 2748US2010221555A1Phenol resin composition, cured article thereof, resin composition for copper-clad-laminate, copper-clad laminate, and novel phenol resinDAINIPPON INK & CHEMICALS·Filed 2006·Application pending·0 cites
- 2848US2016017083A1Modified novolac phenol resin, resist material, coating film, and resist permanent filmDAINIPPON INK & CHEMICALS·Filed 2014·Application pending·0 cites
- 2946US11254778B2Novolak resins and resist materialsDAINIPPON INK & CHEMICALS·Filed 2017·Granted Feb 22, 2022·0 cites·20 claims
- 3046US9481631B2Phenolic hydroxyl group-containing compound, phenolic hydroxyl group-containing composition, (meth)acryloyl group-containing resin, curable composition, cured product thereof, and resist materialDAINIPPON INK & CHEMICALS·Filed 2013·Granted Nov 1, 2016·0 cites·9 claims
- 3146US8946374B2Polyether ester composition, polyurethane resin composition, and optical material using the sameIMADA TOMOYUKI·Filed 2010·Granted Feb 3, 2015·0 cites·14 claims
- 3245US2022315527A1Calixarene compound, curable composition and cured productDAINIPPON INK & CHEMICALS·Filed 2019·Application pending·0 cites
- 3344US10047185B2Novolac-type phenolic hydroxyl group-containing resin, production method therefor, curable composition, composition for resist, and color resistDAINIPPON INK & CHEMICALS·Filed 2015·Granted Aug 14, 2018·0 cites·10 claims
- 3443US2018334523A1Novolac resin and resist filmDAINIPPON INK & CHEMICALS·Filed 2016·Application pending·0 cites
- 3542US11111225B2Calixarene compound and curable compositionDAINIPPON INK & CHEMICALS·Filed 2017·Granted Sep 7, 2021·0 cites·6 claims
- 3641US9963536B2Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer filmDAINIPPON INK & CHEMICALS·Filed 2015·Granted May 8, 2018·0 cites·20 claims
- 3739US10577449B2Phenolic-hydroxyl-group-containing novolac resin and resist filmDAINIPPON INK & CHEMICALS·Filed 2016·Granted Mar 3, 2020·0 cites·14 claims
- 3837US2019077901A1Novolac-type phenolic hydroxy group-containing resin, and resist filmDAINIPPON INK & CHEMICALS·Filed 2016·Application pending·0 cites
- 3937US2018346635A1Novolac resin and resist filmDAINIPPON INK & CHEMICALS·Filed 2016·Application pending·0 cites
- 4035US2017329221A1Photosensitive composition for forming resist underlayer film, and resist underlayer filmDAINIPPON INK & CHEMICALS·Filed 2015·Application pending·0 cites
- 4133US2013331511A1Aqueous urethane resin composition and film, and optical film obtained by using the sameKITADA MITSURU·Filed 2012·Application pending·0 cites
- 4232US2017082923A1Photosensitive composition for permanent films, resist material and coating filmDAINIPPON INK & CHEMICALS·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →