Inventor · disambiguated record
Tomohide Katayama
Also filed as: KATAYAMA TOMOHIDE
8 granted patents·7 pending applications·11 citations·filing 2004–2022
75Inventor score
Files withMERCK PATENT GMBH6AZ ELECTRONIC MAT LUXEMBOURG SARL4AZ ELECTRONIC MATERIALS USA1RIDGEFIELD ACQUISITION1SAO Takayuki1
Top patents by PatentIndex Score
15 records- 0188US8039202B2Positive-working photoimageable bottom antireflective coatingAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Oct 18, 2011·11 cites·19 claims
- 0251US2023314943A1Chemically amplified resist composition and method for manufacturing resist film using the sameMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 0348US2022252977A1A negative tone lift off resist composition comprising an alkali soluble resin and a photo acid generator, and a method for manufacturing metal film patterns on a substrate.MERCK PATENT GMBH·Filed 2020·Application pending·0 cites
- 0446US2025044695A1Method for using composition comprising organic acid compound, lithography composition comprising organic acid compound, and method for manufacturing resist patternMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 0545US2022163888A1Positive type resist composition and method for manufacturing resist pattern using the sameMERCK PATENT GMBH·Filed 2020·Application pending·0 cites
- 0644US10859916B2Composition for forming fine pattern and method for forming fine pattern using the sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Dec 8, 2020·0 cites·17 claims
- 0744US2011165523A1Substrate treating solution and method employing the same for treating a resist substrateWANG XIAOWEI·Filed 2009·Application pending·0 cites
- 0839US2005214674A1Positive-working photoimageable bottom antireflective coatingSUI YU·Filed 2004·Application pending·0 cites
- 0938US12441822B2Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor compositionMERCK PATENT GMBH·Filed 2020·Granted Oct 14, 2025·0 cites·15 claims
- 1037US11079680B2High heat resistance resist composition and pattern forming method using the sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2016·Granted Aug 3, 2021·0 cites·14 claims
- 1137US10106428B2Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticlesAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Oct 23, 2018·0 cites·10 claims
- 1236US2020326623A1A negative tone lift off resist composition comprising an alkali soluble resin and cross linkers and a method for manufacturing metal film patterns on a substrateMERCK PATENT GMBH·Filed 2018·Application pending·0 cites
- 1331US11221558B2Bottom antireflective coating forming compositionAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Jan 11, 2022·0 cites·17 claims
- 1431US11029599B2Chemically amplified positive photoresist composition and pattern forming method using sameRIDGEFIELD ACQUISITION·Filed 2017·Granted Jun 8, 2021·0 cites·9 claims
- 1527US8852855B2Upper surface antireflective film forming composition and pattern forming method using sameSAO Takayuki·Filed 2012·Granted Oct 7, 2014·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →