Inventor · disambiguated record
Tomohiro Kobayashi
Also filed as: KOBAYASHI TOMOHIRO
112 granted patents·42 pending applications·1,146 citations·filing 1994–2025
99Inventor score
Top patents by PatentIndex Score
154 records- 0199US7598016B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Oct 6, 2009·107 cites·13 claims
- 0298US7537880B2Polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 26, 2009·258 cites·10 claims
- 0396US8795942B2Positive resist composition and patterning processKOBAYASHI TOMOHIRO·Filed 2007·Granted Aug 5, 2014·38 cites·20 claims
- 0496US6830866B2Resist composition and patterning processSHI ETSU CHEMICAL CO LTD·Filed 2002·Granted Dec 14, 2004·77 cites·14 claims
- 0595US11693314B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 4, 2023·4 cites·19 claims
- 0695US6749988B2Amine compounds, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 15, 2004·43 cites·20 claims
- 0794US8703384B2Positive resist composition and patterning processKOBAYASHI TOMOHIRO·Filed 2011·Granted Apr 22, 2014·11 cites·6 claims
- 0894US8057981B2Resist composition, resist protective coating composition, and patterning processHARADA YUJI·Filed 2009·Granted Nov 15, 2011·19 cites·16 claims
- 0993US8597869B2Sulfonium salt, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Dec 3, 2013·10 cites·7 claims
- 1093US8252504B2Polymer, resist composition, and patterning processHARADA YUJI·Filed 2009·Granted Aug 28, 2012·19 cites·9 claims
- 1193US7629108B2Nitrogen-containing organic compound, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Dec 8, 2009·16 cites·10 claims
- 1292US9221742B2Sulfonium salt, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 29, 2015·7 cites·17 claims
- 1392US8268528B2Resist composition and patterning processHARADA YUJI·Filed 2009·Granted Sep 18, 2012·14 cites·19 claims
- 1492US5675274ASemiconductor clock signal generation circuitTOSHIBA KK·Filed 1995·Granted Oct 7, 1997·94 cites·9 claims
- 1591US12050402B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 30, 2024·2 cites·17 claims
- 1690US8431323B2Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning processWATANABE TAKERU·Filed 2009·Granted Apr 30, 2013·7 cites·28 claims
- 1789US9877506B2Flavor inhalerJAPAN TOBACCO INC·Filed 2016·Granted Jan 30, 2018·2 cites·6 claims
- 1889US9122152B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 1, 2015·6 cites·13 claims
- 1989US9081290B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2013·Granted Jul 14, 2015·6 cites·15 claims
- 2089US8900793B2Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist compositionSAGEHASHI MASAYOSHI·Filed 2012·Granted Dec 2, 2014·7 cites·8 claims
- 2189US5808504AInsulated gate transistor drive circuitMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Sep 15, 1998·104 cites·9 claims
- 2287US8535869B2Sulfonium salt, resist composition, and patterning processOHSAWA YOUICHI·Filed 2011·Granted Sep 17, 2013·7 cites·6 claims
- 2387US7718342B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted May 18, 2010·9 cites·15 claims
- 2487US6512067B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·23 cites·18 claims
- 2587US6455223B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 24, 2002·28 cites·14 claims
- 2686US6605408B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Aug 12, 2003·29 cites·9 claims
- 2785US9182668B2Patterning process, resist composition, polymer, and monomerSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 10, 2015·4 cites·13 claims
- 2884US6743564B2Amine compounds, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 1, 2004·22 cites·27 claims
- 2983US12072627B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2023·Granted Aug 27, 2024·0 cites·12 claims
- 3083US11204523B2Display device and surface light sourceFUNAI ELECTRIC CO·Filed 2021·Granted Dec 21, 2021·1 cites·19 claims
- 3182US9270199B2Power conversion apparatus with a laminated bus bar comprising an exposed heat radiating portionKOBAYASHI TOMOHIRO·Filed 2011·Granted Feb 23, 2016·11 cites·7 claims
- 3282US8900796B2Acid generator, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Dec 2, 2014·3 cites·15 claims
- 3382US8722321B2Patterning processKOBAYASHI TOMOHIRO·Filed 2012·Granted May 13, 2014·4 cites·15 claims
- 3482US8083015B2Hybrid vehicleKOBAYASHI TOMOHIRO·Filed 2006·Granted Dec 27, 2011·15 cites·4 claims
- 3582US7090961B2Photo acid generator, chemical amplification resist material and pattern formation methodSHINETSU CHEMICAL CO·Filed 2003·Granted Aug 15, 2006·18 cites·15 claims
- 3680US6878508B2Resist patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Apr 12, 2005·18 cites·7 claims
- 3779US7211367B2Photo acid generator, chemical amplification resist materialSHINETSU CHEMICAL CO·Filed 2006·Granted May 1, 2007·4 cites·8 claims
- 3879US6794111B2Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparationSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 21, 2004·16 cites·26 claims
- 3978US7334239B2Optical disc apparatusFUNAI ELECTRIC CO·Filed 2005·Granted Feb 19, 2008·3 cites·12 claims
- 4078US6414101B1Dendritic polymers and making methodSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·20 cites·20 claims
- 4177US12413114B2Vibration motor with housing having first and second notches for lead wire and flexible printed circuit boardNIDEC CORP·Filed 2023·Granted Sep 9, 2025·0 cites·8 claims
- 4276US9313933B2Power converter performing evaporative cooling of a switching elementSUGAHARA TETSUO·Filed 2011·Granted Apr 12, 2016·5 cites·17 claims
- 4376US9213235B2Patterning process, resist composition, polymer, and monomerSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 15, 2015·2 cites·13 claims
- 4476US9091933B2Negative pattern forming processSHINETSU CHEMICAL CO·Filed 2012·Granted Jul 28, 2015·2 cites·15 claims
- 4576US2025370342A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 4675US9122155B2Sulfonium salt, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 1, 2015·1 cites·18 claims
- 4775US7303852B2Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming methodSHINETSU CHEMICAL CO·Filed 2003·Granted Dec 4, 2007·6 cites·17 claims
- 4874US8628908B2Chemically amplified resist composition and patterning processWATANABE TAKERU·Filed 2012·Granted Jan 14, 2014·2 cites·8 claims
- 4974US7727704B2Positive resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 1, 2010·3 cites·4 claims
- 5073US8808964B2Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Aug 19, 2014·1 cites·4 claims
Showing the top 50 of 154 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Tomohiro Kobayashi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →