Inventor · disambiguated record
Tomoya Kudo
Also filed as: KUDO TOMOYA
13 granted patents·15 pending applications·12 citations·filing 2000–2023
84Inventor score
Top patents by PatentIndex Score
28 records- 0184US10991566B2Time-of-flight mass spectrometerSHIMADZU CORP·Filed 2017·Granted Apr 27, 2021·3 cites·11 claims
- 0270US11443934B2Time-of-flight mass spectrometry deviceSHIMADZU CORP·Filed 2018·Granted Sep 13, 2022·1 cites·13 claims
- 0370US11361956B2Time-of-flight mass spectrometerSHIMADZU CORP·Filed 2021·Granted Jun 14, 2022·0 cites·7 claims
- 0468US10985004B2Mass spectrometerSHIMADZU CORP·Filed 2017·Granted Apr 20, 2021·1 cites·5 claims
- 0566US11201046B2Orthogonal acceleration time-of-flight mass spectrometer and lead-in electrode for the sameSHIMADZU CORP·Filed 2018·Granted Dec 14, 2021·1 cites·10 claims
- 0656US11862451B2Orthogonal acceleration time-of-flight mass spectrometerSHIMADZU CORP·Filed 2022·Granted Jan 2, 2024·0 cites·4 claims
- 0756US6806032B2Negative-type photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Oct 19, 2004·6 cites·12 claims
- 0853US2010055612A1Nagative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2009·Application pending·0 cites
- 0953US2010068480A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2009·Application pending·0 cites
- 1052US2009075200A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2008·Application pending·0 cites
- 1152US2025336659A1Sample Plate Holder for Mass SpectrometerSHIMADZU CORP·Filed 2023·Application pending·0 cites
- 1251US11915919B2Mass spectrometerSHIMADZU CORP·Filed 2019·Granted Feb 27, 2024·0 cites·7 claims
- 1351US11081333B2Power connector for mass spectrometerSHIMADZU CORP·Filed 2018·Granted Aug 3, 2021·0 cites·10 claims
- 1450US11257666B2Time-of-flight mass spectrometerSHIMADZU CORP·Filed 2018·Granted Feb 22, 2022·0 cites·4 claims
- 1550US2008070160A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2007·Application pending·0 cites
- 1648US2007111141A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2006·Application pending·0 cites
- 1747US12266518B2Ion analyzerSHIMADZU CORP·Filed 2020·Granted Apr 1, 2025·0 cites·10 claims
- 1847US2006275702A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2006·Application pending·0 cites
- 1946US2006057495A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2005·Application pending·0 cites
- 2046US2006147838A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2006·Application pending·0 cites
- 2145US11295945B2Time-of-flight mass spectrometerSHIMADZU CORP·Filed 2018·Granted Apr 5, 2022·0 cites·8 claims
- 2245US11152202B2Time-of-flight mass spectrometerSHIMADZU CORP·Filed 2018·Granted Oct 19, 2021·0 cites·3 claims
- 2344US2025087475A1Mass spectrometerSHIMADZU CORP·Filed 2022·Application pending·0 cites
- 2444US2025149323A1Mass spectrometry deviceSHIMADZU CORP·Filed 2022·Application pending·0 cites
- 2543US2009068413A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameTAKANASHI HIROSHI·Filed 2007·Application pending·0 cites
- 2639US2001010893A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameFiled 2000·Application pending·0 cites
- 2739US2001019811A1Negative-working photosensitive resin composition and photosensitive resin plate using the sameFiled 2001·Application pending·0 cites
- 2839US2008119581A1Material for Metallic-Pattern Formation, Crosslinking Monomer, and Method of Forming Metallic PatternTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →