Inventor · disambiguated record
Tom Lii
Also filed as: LII TOM
12 granted patents·2 pending applications·19 citations·filing 2010–2017
87Inventor score
Top patents by PatentIndex Score
14 records- 0179US10134731B2Dielectric liner added after contact etch before silicide formationTEXAS INSTRUMENTS INC·Filed 2017·Granted Nov 20, 2018·2 cites·11 claims
- 0278US9406779B2Spacer shaper formation with conformal dielectric film for void free PMD gap fillTEXAS INSTRUMENTS INC·Filed 2015·Granted Aug 2, 2016·2 cites·11 claims
- 0377US9659935B2Dielectric liner added after contact etch before silicide formationTEXAS INSTRUMENTS INC·Filed 2015·Granted May 23, 2017·2 cites·17 claims
- 0477US9093303B2Spacer shaper formation with conformal dielectric film for void free PMD gap fillTEXAS INSTRUMENTS INC·Filed 2013·Granted Jul 28, 2015·3 cites·9 claims
- 0574US9093380B2Dielectric liner added after contact etch before silicide formationTEXAS INSTRUMENTS INC·Filed 2013·Granted Jul 28, 2015·3 cites·12 claims
- 0669US9054158B2Method of forming a metal contact opening with a width that is smaller than the minimum feature size of a photolithographically-defined openingTEXAS INSTRUMENTS INC·Filed 2013·Granted Jun 9, 2015·2 cites·20 claims
- 0768US9385044B2Replacement gate processTEXAS INSTRUMENTS INC·Filed 2013·Granted Jul 5, 2016·2 cites·11 claims
- 0864US9437449B2Uniform, damage free nitride etchTEXAS INSTRUMENTS INC·Filed 2013·Granted Sep 6, 2016·1 cites·20 claims
- 0961US8507386B2Lateral uniformity in silicon recess etchFARBER DAVID GERALD·Filed 2010·Granted Aug 13, 2013·2 cites·17 claims
- 1054US9741624B2Spacer shaper formation with conformal dielectric film for void free PMD gap fillTEXAS INSTRUMENTS INC·Filed 2016·Granted Aug 22, 2017·0 cites·20 claims
- 1149US9704720B2Uniform, damage free nitride ETCHTEXAS INSTRUMENTS INC·Filed 2016·Granted Jul 11, 2017·0 cites·20 claims
- 1243US9224657B2Hard mask for source/drain epitaxy controlTEXAS INSTRUMENTS INC·Filed 2013·Granted Dec 29, 2015·0 cites·19 claims
- 1342US2015187661A1Dual layer hardmask for embedded epi growthTEXAS INSTRUMENTS INC·Filed 2014·Application pending·0 cites
- 1437US2012100717A1Trench lithography processLII TOM·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Tom Lii files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →