Inventor · disambiguated record
Toshiaki Ohmori
Also filed as: OHMORI TOSHIAKI
18 granted patents·1 pending application·707 citations·filing 1985–2001
96Inventor score
Top patents by PatentIndex Score
19 records- 0188US5934566AWashing apparatus and washing methodMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Aug 10, 1999·90 cites·21 claims
- 0286US6048409AWashing apparatus and washing methodMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Apr 11, 2000·73 cites·7 claims
- 0385US5147466AMethod of cleaning a surface by blasting the fine frozen particles against the surfaceMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Sep 15, 1992·52 cites·4 claims
- 0485US4932168AProcessing apparatus for semiconductor wafersTAIYO SANSO CO LTD·Filed 1988·Granted Jun 12, 1990·60 cites·12 claims
- 0580US5025597AProcessing apparatus for semiconductor wafersTAIYO SANSO CO LTD·Filed 1990·Granted Jun 25, 1991·58 cites·6 claims
- 0680US4974375AIce particle forming and blasting deviceMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Dec 4, 1990·55 cites·11 claims
- 0779US5035750AProcessing method for semiconductor wafersTAIYO SANSO CO LTD·Filed 1990·Granted Jul 30, 1991·56 cites·19 claims
- 0876US4986216ASemiconductor manufacturing apparatusMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Jan 22, 1991·46 cites·19 claims
- 0973US5336356AApparatus for treating the surface of a semiconductor substrateMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Aug 9, 1994·55 cites·4 claims
- 1072US5074083ACleaning device using fine frozen particlesMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Dec 24, 1991·30 cites·6 claims
- 1166US4941489ACarrier cleaning and drying apparatusDAN SCIENCE CO LTD·Filed 1989·Granted Jul 17, 1990·36 cites·9 claims
- 1264US4869090AMethod of processing base plate for magnetic discMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Sep 26, 1989·15 cites·3 claims
- 1357US5081068AMethod of treating surface of substrate with ice particles and hydrogen peroxideMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Jan 14, 1992·27 cites·8 claims
- 1454US4868996AMethod and apparatus for vapor dryingMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Sep 26, 1989·20 cites·9 claims
- 1547US4820650AIntroducing lattice defect with ice particles in semiconductor waferMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Apr 11, 1989·17 cites·7 claims
- 1643US4696184ADevice for measuring the absolute value of the density of salts in atmosphereMITSUBISHI ELECTRIC CORP·Filed 1985·Granted Sep 29, 1987·9 cites·16 claims
- 1735US6151914AMethod and apparatus for producing super clean airTAIYO TOYO SANSO CO LTD·Filed 1998·Granted Nov 28, 2000·5 cites·20 claims
- 1835US2002056700A1Method and system for manufacturing semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
- 1933US6586345B1Method of manufacturing a semiconductor device wiring layer having an oxide layer between the polysilicon and silicide layersMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jul 1, 2003·3 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →