Inventor · disambiguated record
Tom Schram
Also filed as: SCHRAM TOM
10 granted patents·9 pending applications·444 citations·filing 2004–2025
87Inventor score
Files withIMEC VZW6IMEC INTER UNI MICRO ELECTR5IMEC3GOVOREANU BOGDAN1KONINKL PHILIPS ELECTRONICS NV1
Top patents by PatentIndex Score
19 records- 0195US9287273B2Method for manufacturing a semiconductor device comprising transistors each having a different effective work functionIMEC VZW·Filed 2015·Granted Mar 15, 2016·418 cites·12 claims
- 0291US10607896B2Method of forming gate of semiconductor device and semiconductor device having sameIMEC VZW·Filed 2017·Granted Mar 31, 2020·9 cites·17 claims
- 0372US9245759B2Method for manufacturing a dual work function semiconductor deviceIMEC·Filed 2013·Granted Jan 26, 2016·4 cites·20 claims
- 0468US10424517B2Method for manufacturing a dual work function semiconductor device and the semiconductor device made thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Sep 24, 2019·1 cites·20 claims
- 0562US9892923B2Method for tuning the effective work function of a metalIMEC VZW·Filed 2015·Granted Feb 13, 2018·1 cites·18 claims
- 0662US7226827B2Method for fabricating semiconductor devices having silicided electrodesKONINKL PHILIPS ELECTRONICS NV·Filed 2004·Granted Jun 5, 2007·9 cites·32 claims
- 0760US8324116B2Substrate treating method and method of manufacturing semiconductor device using the sameVOS RITA·Filed 2010·Granted Dec 4, 2012·2 cites·3 claims
- 0852US2023189497A1Static random-access memory device with three-layered cell designIMEC VZW·Filed 2022·Application pending·0 cites
- 0952US2025311347A1Method for forming a 2d channel field-effect transistor deviceIMEC VZW·Filed 2025·Application pending·0 cites
- 1049US2025308889A1Method for forming a tmd layer structureIMEC VZW·Filed 2025·Application pending·0 cites
- 1148US8021948B2Scalable interpoly dielectric stacks with improved immunity to program saturationIMEC·Filed 2008·Granted Sep 20, 2011·0 cites·8 claims
- 1244US2010219481A1Method for manufacturing a dual work function semiconductor device and the semiconductor device made thereofIMEC·Filed 2010·Application pending·0 cites
- 1342US8211812B2Method for fabricating a high-K dielectric layerRAGNARSSON LARS-AKE·Filed 2008·Granted Jul 3, 2012·0 cites·15 claims
- 1441US8441064B2Scalable interpoly dielectric stacks with improved immunity to program saturationGOVOREANU BOGDAN·Filed 2011·Granted May 14, 2013·0 cites·16 claims
- 1541US2008164581A1Electronic device and process for manufacturing the sameIMEC INTER UNI MICRO ELECTR·Filed 2008·Application pending·0 cites
- 1641US2007215951A1Semiconductor devices having silicided electrodesIMEC INTER UNI MICRO ELECTR·Filed 2007·Application pending·0 cites
- 1740US2008308881A1Method for Controlled Formation of a Gate Dielectric StackIMEC INTER UNI MICRO ELECTR·Filed 2008·Application pending·0 cites
- 1838US2007272967A1Method for Modulating the Effective Work FunctionIMEC INTER UNI MICRO ELECTR·Filed 2007·Application pending·0 cites
- 1936US2009050982A1Method for Modulating the Effective Work FunctionIMEC INTER UNI MICRO ELECTR·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →