Inventor · disambiguated record
Tomoaki Seko
Also filed as: SEKO TOMOAKI
4 granted patents·11 pending applications·1 citations·filing 2009–2023
55Inventor score
Top patents by PatentIndex Score
15 records- 0164US10234762B2Pattern-forming methodJSR CORP·Filed 2016·Granted Mar 19, 2019·1 cites·18 claims
- 0258US2023069221A1Composition for resist underlayer film formation, and method of producing semiconductor substrateJSR CORP·Filed 2022·Application pending·0 cites
- 0354US2009246479A1Ink-jet recording water-based ink compositionSEIKO EPSON CORP·Filed 2009·Application pending·0 cites
- 0452US2023340266A1Silicon-containing composition and method for manufacturing semiconductor substrateJSR CORP·Filed 2023·Application pending·0 cites
- 0551US2009318618A1Polymer composition for aqueous binderJSR CORP·Filed 2009·Application pending·0 cites
- 0649US2023053159A1Resist underlayer film-forming composition, resist underlayer film, and method of producing semiconductor substrateJSR CORP·Filed 2022·Application pending·0 cites
- 0746US12098282B2Film-forming composition, silicon-containing film, and resist pattern-forming methodJSR CORP·Filed 2020·Granted Sep 24, 2024·0 cites·20 claims
- 0846US8956807B2Method for forming resist pattern, and composition for forming resist underlayer filmJSR CORP·Filed 2012·Granted Feb 17, 2015·0 cites·8 claims
- 0946US2009189510A1Metal-coating material, method for protecting metal, and light emitting deviceJSR CORP·Filed 2009·Application pending·0 cites
- 1046US2022146940A1Composition, silicon-containing film, method of forming silicon-containing film, and method of treating semiconductor substrateJSR CORP·Filed 2022·Application pending·0 cites
- 1144US2020117091A1Pattern-forming method, and silicon-containing film-forming compositionJSR CORP·Filed 2019·Application pending·0 cites
- 1243US9250526B2Composition for forming resist underlayer film, and pattern-forming methodJSR CORP·Filed 2013·Granted Feb 2, 2016·0 cites·12 claims
- 1338US2019025699A1Film-forming material for resist process and pattern-forming methodJSR CORP·Filed 2018·Application pending·0 cites
- 1429US2015355546A1Composition for silicon-containing film formation, pattern-forming method, and polysiloxane compoundJSR CORP·Filed 2015·Application pending·0 cites
- 1529US2020218161A1Resist pattern-forming method and substrate-treating methodJSR CORP·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →