Inventor · disambiguated record
Toshihide Yoshida
Also filed as: YOSHIDA TOSHIHIDE
24 granted patents·8 pending applications·219 citations·filing 2000–2023
95Inventor score
Top patents by PatentIndex Score
32 records- 0195US6645229B2Slimming deviceMATSUSHITA ELECTRIC WORKS LTD·Filed 2000·Granted Nov 11, 2003·113 cites·36 claims
- 0294US11873916B2Fluid control device, fluid supply system, and fluid supply methodFUJIKIN KK·Filed 2021·Granted Jan 16, 2024·2 cites·10 claims
- 0393US9625047B2Flow control valve for flow controllerFUJIKIN KK·Filed 2014·Granted Apr 18, 2017·14 cites·14 claims
- 0489US9010369B2Flow rate range variable type flow rate control apparatusFUJIKIN KK·Filed 2013·Granted Apr 21, 2015·8 cites·3 claims
- 0588US8418714B2Flow rate range variable type flow rate control apparatusOHMI TADAHIRO·Filed 2006·Granted Apr 16, 2013·16 cites·4 claims
- 0687US9383758B2Flow rate range variable type flow rate control apparatusFUJIKIN KK·Filed 2015·Granted Jul 5, 2016·4 cites·4 claims
- 0786US11098819B2Valve device, flow control method using the same, and semiconductor manufacturing methodFUJIKIN KK·Filed 2017·Granted Aug 24, 2021·4 cites·13 claims
- 0884US9133951B2Gasket type orifice and pressure type flow rate control apparatus for which the orifice is employedOHMI TADAHIRO·Filed 2006·Granted Sep 15, 2015·14 cites·11 claims
- 0981US9115813B2Fluid control deviceHIROSE TAKASHI·Filed 2010·Granted Aug 25, 2015·6 cites·8 claims
- 1080US10372145B2Pressure-type flow rate control deviceFUJIKIN KK·Filed 2014·Granted Aug 6, 2019·4 cites·10 claims
- 1180US8381755B2Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the sameFUJIKIN KK·Filed 2012·Granted Feb 26, 2013·5 cites·2 claims
- 1280US8210022B2Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the sameMORIYA SHUJI·Filed 2008·Granted Jul 3, 2012·9 cites·7 claims
- 1378US9127796B2Gasket type orifice and pressure type flow rate control apparatus for which the orifice is employedHIROSE TAKASHI·Filed 2011·Granted Sep 8, 2015·5 cites·6 claims
- 1477US12209679B2Fluid control device, fluid supply system, and fluid supply methodFUJIKIN KK·Filed 2023·Granted Jan 28, 2025·0 cites·10 claims
- 1576US11242934B2Valve deviceFUJIKIN KK·Filed 2018·Granted Feb 8, 2022·2 cites·7 claims
- 1675US11022224B2Valve device, flow control method using the same, and semiconductor manufacturing methodFUJIKIN KK·Filed 2017·Granted Jun 1, 2021·3 cites·10 claims
- 1772US11322372B2Fluid supply device and liquid discharge method of this deviceFUJIKIN KK·Filed 2018·Granted May 3, 2022·1 cites·7 claims
- 1872US11187346B2Valve device, its control device, control methods using the same, fluid control device and semiconductor manufacturing apparatusFUJIKIN KK·Filed 2018·Granted Nov 30, 2021·1 cites·3 claims
- 1971US9921089B2Flow rate range variable type flow rate control apparatusFUJIKIN KK·Filed 2016·Granted Mar 20, 2018·2 cites·4 claims
- 2071US9163748B2Fluid control device and flow rate control apparatusHIROSE TAKASHI·Filed 2010·Granted Oct 20, 2015·5 cites·8 claims
- 2170US11506290B2Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing methodFUJIKIN KK·Filed 2018·Granted Nov 22, 2022·1 cites·4 claims
- 2249US11598430B2Valve device, flow rate control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatus using the valve deviceFUJIKIN KK·Filed 2020·Granted Mar 7, 2023·0 cites·7 claims
- 2349US2015160662A1Flow rate range variable type flow rate control apparatusFUJIKIN KK·Filed 2015·Application pending·0 cites
- 2448US2023136494A1Valve system, output monitoring method and output adjusting method for diaphragm valve, and semiconductor manufacturing apparatusFUJIKIN KK·Filed 2021·Application pending·0 cites
- 2546US11569101B2Fluid supply device and fluid supply methodFUJIKIN KK·Filed 2018·Granted Jan 31, 2023·0 cites·5 claims
- 2646US11512993B2Valve device, adjustment information generating method, flow rate adjusting method, fluid control system, flow rate control method, semiconductor manufacturing system and semiconductor manufacturing methodFUJIKIN KK·Filed 2018·Granted Nov 29, 2022·0 cites·9 claims
- 2746US2021372532A1Valve deviceFUJIKIN KK·Filed 2021·Application pending·0 cites
- 2843US2022275871A1Diaphragm valveFUJIKIN KK·Filed 2020·Application pending·0 cites
- 2943US2022082176A1Valve device, flow control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatusFUJIKIN KK·Filed 2020·Application pending·0 cites
- 3042US2021125839A1Fluid supply device and fluid supply methodFUJIKIN KK·Filed 2018·Application pending·0 cites
- 3140US2011120566A1Discontinuous switching fluid flow rate control method using pressure type flow rate control deviceFUJIKIN KK·Filed 2010·Application pending·0 cites
- 3239US2020386342A1Valve deviceFUJIKIN KK·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →