Inventor · disambiguated record
Tomoharu Yoshino
Also filed as: YOSHINO TOMOHARU
23 granted patents·11 pending applications·13 citations·filing 2012–2025
91Inventor score
Top patents by PatentIndex Score
34 records- 0187US12275748B2Amidinate compound, dimer compound thereof, thin-film forming raw material, and method of producing thin filmADEKA CORP·Filed 2021·Granted Apr 15, 2025·2 cites·3 claims
- 0285US9359382B2β-ketoimine ligand, method of preparing the same, metal complex comprising the same and method of forming thin film using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jun 7, 2016·2 cites·2 claims
- 0378US10882874B2Vanadium compoundADEKA CORP·Filed 2017·Granted Jan 5, 2021·2 cites·3 claims
- 0475US9994593B2Copper compound, starting material for forming thin film, and method for manufacturing thin filmADEKA CORP·Filed 2015·Granted Jun 12, 2018·2 cites·3 claims
- 0574US9896468B2Metal alkoxide compound, thin-film-forming material, method for producing thin film, and alcohol compoundADEKA CORP·Filed 2013·Granted Feb 20, 2018·1 cites·7 claims
- 0672US11618762B2Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compoundADEKA CORP·Filed 2021·Granted Apr 4, 2023·0 cites·4 claims
- 0771US9359383B2β-ketoimine ligand, method of preparing the same, metal complex comprising the same and method of forming thin film using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jun 7, 2016·0 cites·6 claims
- 0869US12480207B2Tin compound, thin-film forming raw material, thin-film, method for producing thin-film, and halogen compoundADEKA CORP·Filed 2022·Granted Nov 25, 2025·0 cites·6 claims
- 0969US11623935B2Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compoundADEKA CORP·Filed 2019·Granted Apr 11, 2023·0 cites·2 claims
- 1068US12371778B2Cobalt compound, thin-film forming raw material, thin-film, and method of producing thin-filmADEKA CORP·Filed 2022·Granted Jul 29, 2025·0 cites·7 claims
- 1168US10155784B2Alcohol compoundADEKA CORP·Filed 2018·Granted Dec 18, 2018·0 cites·1 claims
- 1267US10167304B2Ruthenium compound, material for thin film formation, and process for thin film formationADEKA CORP·Filed 2014·Granted Jan 1, 2019·0 cites·7 claims
- 1366US2025154648A1Precursor for forming metal thin film, manufacturing method using the same, and metal thin film manufactured therebySAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1465US9663538B2Aluminum compound, thin-film forming raw material, and method for producing thin filmADEKA CORP·Filed 2013·Granted May 30, 2017·1 cites·18 claims
- 1563US11555044B2Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compoundADEKA CORP·Filed 2019·Granted Jan 17, 2023·0 cites·1 claims
- 1663US10118940B2Alkoxide compound and raw material for forming thin filmWADA SENJI·Filed 2012·Granted Nov 6, 2018·2 cites·13 claims
- 1762US11161867B2Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compoundADEKA CORP·Filed 2017·Granted Nov 2, 2021·0 cites·4 claims
- 1862US10253408B2Compound, thin film-forming material, and thin film manufacturing methodADEKA CORP·Filed 2016·Granted Apr 9, 2019·1 cites·10 claims
- 1960US12415821B2Tin compound, thin-film forming raw material containing said compound, thin film formed from said thin-film forming raw material, method of producing said thin film using said compound as precursor, and method of producing said thin filmADEKA CORP·Filed 2020·Granted Sep 16, 2025·0 cites·6 claims
- 2058US2025305120A1Method for selective deposition of layer of interestSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 2157US2018282358A1Alkoxide compound, thin film-forming starting material, thin film formation method, and alcohol compoundADEKA CORP·Filed 2018·Application pending·0 cites
- 2255US10011623B2Alkoxide compound, thin film-forming starting material, and thin film formation methodADEKA CORP·Filed 2015·Granted Jul 3, 2018·0 cites·2 claims
- 2355US2024243010A1Inhibitor for selectively depositing thin film and method for selectively depositing thin filmSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2453US10364495B2Method for producing a thin filmADEKA CORP·Filed 2017·Granted Jul 30, 2019·0 cites·4 claims
- 2553US2023369039A1Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2653US2012251724A1Beta-ketoimine ligand, method of preparing the same, metal complex comprising the same and method of forming thin film using the sameCHO YOUN-JOUNG·Filed 2012·Application pending·0 cites
- 2749US11760771B2Ruthenium compound, raw material for forming thin film, and method for producing thin filmADEKA CORP·Filed 2018·Granted Sep 19, 2023·0 cites·3 claims
- 2849US10920313B2Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin filmADEKA CORP·Filed 2017·Granted Feb 16, 2021·0 cites·4 claims
- 2948US2023215723A1Methods of manufacturing integrated circuit devices using carbonyl compoundsSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 3046US2024018655A1Method of producing thin-filmADEKA CORP·Filed 2021·Application pending·0 cites
- 3146US2024018654A1Method of producing thin-filmADEKA CORP·Filed 2021·Application pending·0 cites
- 3244US10351584B2Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compoundADEKA CORP·Filed 2015·Granted Jul 16, 2019·0 cites·3 claims
- 3340US2017050998A1Cobalt compound, thin film-forming raw material, and method for producing thin filmADEKA CORP·Filed 2015·Application pending·0 cites
- 3434US2018037540A1Diazadienyl compound, raw material for forming thin film, method for producing thin film, and diazadiene compoundADEKA CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →