Inventor · disambiguated record
Tsubasa Abe
Also filed as: ABE TSUBASA
9 granted patents·2 pending applications·8 citations·filing 2011–2021
78Inventor score
Top patents by PatentIndex Score
11 records- 0171US9958781B2Method for film formation, and pattern-forming methodJSR CORP·Filed 2016·Granted May 1, 2018·2 cites·12 claims
- 0270US9620378B1Composition for film formation, film, production method of patterned substrate, and compoundJSR CORP·Filed 2015·Granted Apr 11, 2017·2 cites·15 claims
- 0367US11003079B2Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compoundJSR CORP·Filed 2018·Granted May 11, 2021·1 cites·19 claims
- 0465US11243468B2Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production methodJSR CORP·Filed 2019·Granted Feb 8, 2022·1 cites·17 claims
- 0558US9484154B2Capacitor device and method for manufacturing sameHONDA IKUFUMI·Filed 2011·Granted Nov 1, 2016·2 cites·1 claims
- 0649US10520814B2Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrateJSR CORP·Filed 2017·Granted Dec 31, 2019·0 cites·13 claims
- 0746US11320739B2Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrateJSR CORP·Filed 2018·Granted May 3, 2022·0 cites·20 claims
- 0846US2021286267A1Composition, resist underlayer film, and resist pattern-forming methodJSR CORP·Filed 2021·Application pending·0 cites
- 0944US11126084B2Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compoundJSR CORP·Filed 2019·Granted Sep 21, 2021·0 cites·19 claims
- 1034US2017137663A9Composition for resist underlayer film formation, resist underlayer film, and production method of patterned substrateJSR CORP·Filed 2016·Application pending·0 cites
- 1133US10053539B2Composition for film formation, film, production method of patterned substrate, and compoundJSR CORP·Filed 2015·Granted Aug 21, 2018·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →