Inventor · disambiguated record
Tsuan-Chung Chang
Also filed as: CHANG TSUAN-CHUNG
4 granted patents·8 pending applications·0 citations·filing 2021–2023
54Inventor score
Files withINTEL CORP12
Top patents by PatentIndex Score
12 records- 0166US12507464B2Gate aligned fin cut for advanced integrated circuit structure fabricationINTEL CORP·Filed 2021·Granted Dec 23, 2025·0 cites·10 claims
- 0263US12464815B2Fin cut in neighboring gate and source or drain regions for advanced integrated circuit structure fabricationINTEL CORP·Filed 2021·Granted Nov 4, 2025·0 cites·5 claims
- 0352US12490462B2Angled gate or diffusion plugsINTEL CORP·Filed 2022·Granted Dec 2, 2025·0 cites·20 claims
- 0452US2024395815A1Integrated circuit structures having metal-containing fin isolation regionsINTEL CORP·Filed 2023·Application pending·0 cites
- 0549US2024105771A1Integrated circuit structures with channel cap reductionINTEL CORP·Filed 2022·Application pending·0 cites
- 0648US2024096881A1Integrated circuit structures having gate cut plug removed from trench contact using angled directional etchINTEL CORP·Filed 2022·Application pending·0 cites
- 0747US2023290841A1Spacer self-aligned via structures using assisted grating for gate contact or trench contactINTEL CORP·Filed 2022·Application pending·0 cites
- 0846US2023282700A1Fin isolation structures formed after gate metallizationINTEL CORP·Filed 2022·Application pending·0 cites
- 0945US2023290825A1Integrated circuit structures with backside self-aligned conductive source or drain contactINTEL CORP·Filed 2022·Application pending·0 cites
- 1045US2022390990A1Spacer self-aligned via structures for gate contact or trench contactINTEL CORP·Filed 2021·Application pending·0 cites
- 1142US2022415791A1Metal line profile shaping for advanced integrated circuit structure fabricationINTEL CORP·Filed 2021·Application pending·0 cites
- 1241US12405526B2Extreme ultraviolet lithography patterning with assist featuresINTEL CORP·Filed 2021·Granted Sep 2, 2025·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →