Inventor · disambiguated record
Tsung Chuan Lee
Also filed as: LEE TSUNG CHUAN
18 granted patents·1 pending application·10 citations·filing 2013–2024
89Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD19
Top patents by PatentIndex Score
19 records- 0191US11275301B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 15, 2022·3 cites·20 claims
- 0289US11774844B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 3, 2023·1 cites·20 claims
- 0389US10976674B2Method for detecting EUV pellicle ruptureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 13, 2021·3 cites·20 claims
- 0488US11119420B2Particle prevention method in lithography exposure apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Sep 14, 2021·2 cites·20 claims
- 0587US2025093764A1Extreme ultraviolet maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0684US12181791B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 0784US12072633B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 27, 2024·0 cites·20 claims
- 0883US12216399B2Method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Feb 4, 2025·0 cites·20 claims
- 0983US11392022B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 19, 2022·1 cites·20 claims
- 1080US11940727B2Reticle enclosure for lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 26, 2024·0 cites·20 claims
- 1178US12013641B2Method of reducing undesired light influence in extreme ultraviolet exposureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 18, 2024·0 cites·20 claims
- 1278US11720025B2Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 8, 2023·0 cites·20 claims
- 1377US11614683B2Reticle enclosure for lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 28, 2023·0 cites·20 claims
- 1476US12066765B2Operating method for preventing photomask particulate contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 20, 2024·0 cites·20 claims
- 1572US11415879B1Reticle enclosure for lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 16, 2022·0 cites·20 claims
- 1667US11703762B2Method of reducing undesired light influence in extreme ultraviolet exposureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 18, 2023·0 cites·20 claims
- 1762US11506985B2Semiconductor apparatus and method of operating the same for preventing photomask particulate contaminationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 22, 2022·0 cites·20 claims
- 1861US10824080B2Method to reduce native defect printabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 3, 2020·0 cites·20 claims
- 1947US9625822B2Mechanisms for performing a photolithography process with a surface modifying treatment on an exposed photoresist layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 18, 2017·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →