Inventor · disambiguated record
Tsai-Chun Li
Also filed as: LI TSAI-CHUN
11 granted patents·1 pending application·44 citations·filing 2005–2019
87Inventor score
Top patents by PatentIndex Score
12 records- 0195US10050149B1Gate structure for semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Aug 14, 2018·23 cites·20 claims
- 0285US9159581B2Method of making a semiconductor device using a bottom antireflective coating (BARC) layerTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Oct 13, 2015·6 cites·20 claims
- 0385US8546227B2Contact for high-K metal gate deviceCHUANG HAK-LAY·Filed 2011·Granted Oct 1, 2013·7 cites·13 claims
- 0476US10692720B2Methods for controlling an end-to-end distance in semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 23, 2020·1 cites·20 claims
- 0576US9159580B2Method of making a semiconductor device using multiple layer setsTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Oct 13, 2015·3 cites·20 claims
- 0675US10504729B2Methods for controlling an end-to-end distance in semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 10, 2019·1 cites·20 claims
- 0763US8853753B2Contact for high-k metal gate deviceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 7, 2014·1 cites·17 claims
- 0862US8222136B2Method of forming contacts for a semiconductor deviceTU YUAN-TIEN·Filed 2010·Granted Jul 17, 2012·2 cites·20 claims
- 0959US10312089B1Methods for controlling an end-to-end distance in semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 4, 2019·0 cites·20 claims
- 1051US9589798B2Method of making a semiconductor device using a barrier and antireflective coating (BARC) layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·0 cites·20 claims
- 1149US9455156B2Method of making a semiconductor device using multiple layer setsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 27, 2016·0 cites·20 claims
- 1241US2007134917A1Partial-via-first dual-damascene process with tri-layer resist approachTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →