Inventor · disambiguated record
Tzu Yi Wang
Also filed as: WANG TZU YI
15 granted patents·7 pending applications·16 citations·filing 2007–2025
88Inventor score
Top patents by PatentIndex Score
22 records- 0194US12085843B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·1 cites·20 claims
- 0292US11550229B1Enhancing lithography operation for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 10, 2023·2 cites·20 claims
- 0391US12153351B2Enhancing lithography operation for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 26, 2024·1 cites·20 claims
- 0491US11829076B2Enhancing lithography operation for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 28, 2023·1 cites·20 claims
- 0589US11789356B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 17, 2023·1 cites·20 claims
- 0688US2025362588A1Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0786US11237477B2Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Feb 1, 2022·3 cites·20 claims
- 0884US11106126B2Method of manufacturing EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 31, 2021·3 cites·20 claims
- 0981US2024393701A1Enhancing lithography operation for manufacturing semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1079US2024369918A1Method of manufacturing euv photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1178US11048158B2Method for extreme ultraviolet lithography mask treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 29, 2021·2 cites·20 claims
- 1273US12487519B2Reticle containerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 2, 2025·0 cites·20 claims
- 1372US2024393674A1Methods for forming extreme ultraviolet mask comprising magnetic materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1467US11906897B2Method for extreme ultraviolet lithography mask treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 20, 2024·0 cites·20 claims
- 1566US7924405B2Compensation of reticle flatness on focus deviation in optical lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Apr 12, 2011·2 cites·17 claims
- 1665US12092952B2Methods for forming extreme ultraviolet mask comprising magnetic materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 17, 2024·0 cites·20 claims
- 1760US2025201610A1Reticle carrier and method for manufacturing auxiliary structure in reticle carrierTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1857US2023161240A1Manufacturing method of euv photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 1953US11119398B2EUV photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 14, 2021·0 cites·20 claims
- 2052US2021333717A1Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Application pending·0 cites
- 2151US11388504B1Headphone with pressure sensorCHENG UEI PREC IND CO LTD·Filed 2021·Granted Jul 12, 2022·0 cites·4 claims
- 2247US11249384B2Mask for EUV lithography and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Feb 15, 2022·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →