Inventor · disambiguated record
Ulrich Kleinhans
Also filed as: KLEINHANS ULRICH
2 granted patents·9 pending applications·0 citations·filing 2019–2024
25Inventor score
Files withEOS GMBH ELECTRO OPTICAL SYSTEMS11
Top patents by PatentIndex Score
11 records- 0167US2025033285A1Method and device for post-treatment of particles carried in a process gas and filter thereforEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2024·Application pending·0 cites
- 0258US12128627B2Method and device for post-treatment of particles carried in a process gas and filter thereforEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2019·Granted Oct 29, 2024·0 cites·16 claims
- 0353US2025269430A1Method and System for Controlling a Manufacturing Process for Additively Manufacturing a ComponentEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2023·Application pending·0 cites
- 0452US2025001502A1Detection of the oxidation progress of metal condensateEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2022·Application pending·0 cites
- 0544US11806933B2Method of providing a particulate materialEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2019·Granted Nov 7, 2023·0 cites·7 claims
- 0644US2024416588A1Filter deviceEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2022·Application pending·0 cites
- 0743US2024335780A1Passivation device, filter system, device for the additive manufacturing of three-dimensional objects, method for passivating and method for filteringEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2022·Application pending·0 cites
- 0839US2023264263A1Filter device for an additive manufacturing deviceEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2021·Application pending·0 cites
- 0938US2023142672A1Passivation of filter residuesEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2021·Application pending·0 cites
- 1038US2023065558A1Method for moderating a reaction of metal particlesEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2021·Application pending·0 cites
- 1137US2023094578A1Method and device for determining a distance in an additive manufacturing deviceEOS GMBH ELECTRO OPTICAL SYSTEMS·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →