Inventor · disambiguated record
Vijay Immanuel Raman
Also filed as: RAMAN VIJAY IMMANUEL
12 granted patents·3 pending applications·24 citations·filing 2006–2016
85Inventor score
Top patents by PatentIndex Score
15 records- 0185US8008362B2Nanoporous polymer foams of polycondensation reactive resinsBASF SE·Filed 2006·Granted Aug 30, 2011·9 cites·18 claims
- 0280US8679980B2Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP processRAMAN VIJAY IMMANUEL·Filed 2010·Granted Mar 25, 2014·6 cites·24 claims
- 0371US9487675B2Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivativesRAMAN VIJAY IMMANUEL·Filed 2011·Granted Nov 8, 2016·3 cites·11 claims
- 0465US8912273B2Process for the preparation of an aqueous polymer dispersionVENKATESH RAJAN·Filed 2009·Granted Dec 16, 2014·2 cites·13 claims
- 0564US10392531B2Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this processRAMAN VIJAY IMMANUEL·Filed 2010·Granted Aug 27, 2019·2 cites·16 claims
- 0661US9070632B2Aqueous polishing composition and process for chemically mechanically polishing substrates having patterned or unpatterned low-k dielectric layersRAMAN VIJAY IMMANUEL·Filed 2011·Granted Jun 30, 2015·1 cites·14 claims
- 0761US2010148109A1Xerogels made from aromatic polyureasBASF SE·Filed 2008·Application pending·0 cites
- 0858US2016244585A1Xerogels made from aromatic polyureasBASF SE·Filed 2016·Application pending·0 cites
- 0956US2010221519A1Process for producing nano- and mesofibers by electrospinning colloidal dispersions comprising at least one essentially water-insoluble polymerBASF SE·Filed 2008·Application pending·0 cites
- 1055US9255214B2Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particlesLAUTER MICHAEL·Filed 2010·Granted Feb 9, 2016·1 cites·19 claims
- 1142US9005472B2Aqueous polishing agent and graft copolymers and their use in a process for polishing patterned and unstructured metal surfacesRAMAN VIJAY IMMANUEL·Filed 2011·Granted Apr 14, 2015·0 cites·13 claims
- 1240US9328247B2Paper coating slip additive comprising acid monomer, associative monomer and nonionic monomerBASF SE·Filed 2012·Granted May 3, 2016·0 cites·20 claims
- 1337US9028708B2Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this processRAMAN VIJAY IMMANUEL·Filed 2010·Granted May 12, 2015·0 cites·18 claims
- 1436US9275851B2Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devicesKLIPP ANDREAS·Filed 2012·Granted Mar 1, 2016·0 cites·14 claims
- 1534US8747687B2Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfacesRAMAN VIJAY IMMANUEL·Filed 2010·Granted Jun 10, 2014·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →