Inventor · disambiguated record
Victor Wang
Also filed as: WANG VICTOR · WANG VICTOR S
10 granted patents·2 pending applications·407 citations·filing 1997–2024
89Inventor score
Top patents by PatentIndex Score
12 records- 0196US6362071B1Method for forming a semiconductor device with an opening in a dielectric layerMOTOROLA INC·Filed 2000·Granted Mar 26, 2002·149 cites·20 claims
- 0296US5972804AProcess for forming a semiconductor deviceMOTOROLA INC·Filed 1997·Granted Oct 26, 1999·181 cites·15 claims
- 0385US6297173B1Process for forming a semiconductor deviceMOTOROLA INC·Filed 1999·Granted Oct 2, 2001·52 cites·21 claims
- 0469USD722128SAnt bait stationWANG ROGER H·Filed 2014·Granted Feb 3, 2015·15 cites·1 claims
- 0568US2024347502A1Methods of forming stacked integrated circuits using selective thermal atomic layer deposition on conductive contacts and structures formed using the sameUNIV CALIFORNIA·Filed 2024·Application pending·0 cites
- 0664US12497694B2Method of forming low-resistivity Ru ALD through a bi-layer process and related structuresUNIV CALIFORNIA·Filed 2022·Granted Dec 16, 2025·0 cites·19 claims
- 0763US12027488B2Methods of forming stacked integrated circuits using selective thermal atomic layer deposition on conductive contacts and structures formed using the sameUNIV CALIFORNIA·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 0860USD783766SAnt bait stationWANG ROGER H·Filed 2016·Granted Apr 11, 2017·9 cites·1 claims
- 0955US12154787B2Methods of performing selective low resistivity Ru atomic layer deposition and interconnect formed using the sameUNIV CALIFORNIA·Filed 2021·Granted Nov 26, 2024·0 cites·12 claims
- 1044US10110834B2Hadamard enhanced sensorsRICHARDS CHET L·Filed 2011·Granted Oct 23, 2018·0 cites·17 claims
- 1144US2014125678A1Virtual CompanionWANG VICTOR·Filed 2013·Application pending·0 cites
- 1231USD747940SPolinating toolWANG ROGER H·Filed 2014·Granted Jan 26, 2016·1 cites·1 claims
Join the waitlist — get patent alerts
Get an alert when Victor Wang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →