Inventor · disambiguated record
Walter Edmaier
Also filed as: EDMAIER WALTER
1 granted patent·4 pending applications·0 citations·filing 2015–2022
6Inventor score
Technology areasH10P
Files withSILTRONIC AG5
Top patents by PatentIndex Score
5 records- 0143US12503791B2Method of producing epitaxial layer wafers in a chamber of a deposition reactorSILTRONIC AG·Filed 2022·Granted Dec 23, 2025·0 cites·6 claims
- 0233US2024218558A1Method for depositing an epitaxial layer on a substrate wafer made of semiconductor material in a deposition deviceSILTRONIC AG·Filed 2022·Application pending·0 cites
- 0331US2023178398A1Method and device for depositing an epitaxial layer on a substrate wafer made of semiconductor materialSILTRONIC AG·Filed 2021·Application pending·0 cites
- 0431US2023366095A1Method and device for depositing an epitaxial layer on a substrate wafer made of semiconductor materialSILTRONIC AG·Filed 2021·Application pending·0 cites
- 0520US2015294883A1Method for drying wafer substrates and wafer holder for conduction of the methodSILTRONIC AG·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →