Inventor · disambiguated record
Wai Lo
Also filed as: LO WAI · LO WAI CHIU · LO WAI S
20 granted patents·6 pending applications·145 citations·filing 2002–2021
94Inventor score
Top patents by PatentIndex Score
26 records- 0190US7553772B1Process and apparatus for simultaneous light and radical surface treatment of integrated circuit structureLSI CORP·Filed 2005·Granted Jun 30, 2009·19 cites·14 claims
- 0286US7341978B2Superconductor wires for back end interconnectsLSI LOGIC CORP·Filed 2005·Granted Mar 11, 2008·17 cites·12 claims
- 0379US6746925B1High-k dielectric bird's beak optimizations using in-situ O2 plasma oxidationLSI LOGIC CORP·Filed 2003·Granted Jun 8, 2004·27 cites·19 claims
- 0477US7365015B2Damascene replacement metal gate process with controlled gate profile and length using Si1-xGex as sacrificial materialLSI LOGIC CORP·Filed 2004·Granted Apr 29, 2008·20 cites·14 claims
- 0575US7896725B2Balancing system and turning mechanism for remote controlled toySILVERLIT LTD·Filed 2007·Granted Mar 1, 2011·5 cites·40 claims
- 0675US7405116B2Application of gate edge liner to maintain gate length CD in a replacement gate transistor flowLSI CORP·Filed 2004·Granted Jul 29, 2008·18 cites·9 claims
- 0770US6818516B1Selective high k dielectrics removalLSI LOGIC CORP·Filed 2003·Granted Nov 16, 2004·14 cites·20 claims
- 0869US7956401B2Bi-axial texturing of high-K dielectric films to reduce leakage currentsLSI CORP·Filed 2009·Granted Jun 7, 2011·2 cites·34 claims
- 0964US7312127B2Incorporating dopants to enhance the dielectric properties of metal silicatesLSI CORP·Filed 2006·Granted Dec 25, 2007·1 cites·9 claims
- 1062US6830943B1Thin film CMOS calibration standard having protective cover layerLSI LOGIC CORP·Filed 2003·Granted Dec 14, 2004·7 cites·13 claims
- 1154US6864141B1Method of incorporating nitrogen into metal silicate based dielectrics by energized nitrogen ion beamsLSI LOGIC CORP·Filed 2003·Granted Mar 8, 2005·4 cites·21 claims
- 1252US7081406B2Interconnect dielectric tuningLSI LOGIC CORP·Filed 2004·Granted Jul 25, 2006·4 cites·13 claims
- 1349US7259462B1Interconnect dielectric tuningLSI CORP·Filed 2006·Granted Aug 21, 2007·0 cites·4 claims
- 1449US6849512B1Thin gate dielectric for a CMOS transistor and method of fabrication thereofLSI LOGIC CORP·Filed 2002·Granted Feb 1, 2005·4 cites·20 claims
- 1549US6674092B1Thin film CMOS calibration standard having protective cover layerLSI LOGIC CORP·Filed 2002·Granted Jan 6, 2004·2 cites·14 claims
- 1649US2023196483A1Methods and systems for monitoring and verifying construction of solar and energy storage projectsTUSKWARE INC·Filed 2021·Application pending·0 cites
- 1749US2006166745A1Handheld electronic game with recharging functionLO WAI S·Filed 2005·Application pending·0 cites
- 1848US7064062B2Incorporating dopants to enhance the dielectric properties of metal silicatesLSI LOGIC CORP·Filed 2003·Granted Jun 20, 2006·1 cites·16 claims
- 1947US2008150090A1DAMASCENE REPLACEMENT METAL GATE PROCESS WITH CONTROLLED GATE PROFILE AND LENGTH USING Si1-xGex AS SACRIFICIAL MATERIALLSI LOGIC CORP·Filed 2008·Application pending·0 cites
- 2046US8384165B2Application of gate edge liner to maintain gate length CD in a replacement gate transistor flowLSI CORP·Filed 2008·Granted Feb 26, 2013·0 cites·16 claims
- 2145US7619272B2Bi-axial texturing of high-K dielectric films to reduce leakage currentsLSI CORP·Filed 2004·Granted Nov 17, 2009·0 cites·16 claims
- 2243US2006252143A1High resolution semiconductor bio-chip with configuration sensing flexibilityLSI LOGIC CORP·Filed 2005·Application pending·0 cites
- 2340US2007005116A1Implantable, fully integrated and high performance semiconductor device for retinal prosthesesLSI LOGIC CORP·Filed 2005·Application pending·0 cites
- 2438US7413996B2High k gate insulator removalLSI CORP·Filed 2003·Granted Aug 19, 2008·0 cites·4 claims
- 2538US2005064716A1Plasma removal of high k metal oxideFiled 2004·Application pending·0 cites
- 2629US9274410B2Method and system for automated generation of masks for spacer formation from a desired final wafer patternLO WAI·Filed 2010·Granted Mar 1, 2016·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →