Inventor · disambiguated record
Wayne M. Paulson
Also filed as: PAULSON WAYNE · PAULSON WAYNE M
12 granted patents·778 citations·filing 1981–2003
94Inventor score
Top patents by PatentIndex Score
12 records- 0196US5861347AMethod for forming a high voltage gate dielectric for use in integrated circuitMOTOROLA INC·Filed 1997·Granted Jan 19, 1999·188 cites·32 claims
- 0293US4997790AProcess for forming a self-aligned contact structureMOTOROLA INC·Filed 1990·Granted Mar 5, 1991·120 cites·17 claims
- 0392US4392992AChromium-silicon-nitrogen resistor materialMOTOROLA INC·Filed 1981·Granted Jul 12, 1983·42 cites·3 claims
- 0491US6218200B1Multi-layer registration control for photolithography processesMOTOROLA INC·Filed 2000·Granted Apr 17, 2001·71 cites·14 claims
- 0589US6958265B2Semiconductor device with nanoclustersFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Oct 25, 2005·48 cites·45 claims
- 0688US4510178AThin film resistor material and methodMOTOROLA INC·Filed 1983·Granted Apr 9, 1985·34 cites·19 claims
- 0787US4591821AChromium-silicon-nitrogen thin film resistor and apparatusMOTOROLA INC·Filed 1984·Granted May 27, 1986·33 cites·26 claims
- 0886US5918147AProcess for forming a semiconductor device with an antireflective layerMOTOROLA INC·Filed 1995·Granted Jun 29, 1999·89 cites·42 claims
- 0981US4956314ADifferential etching of silicon nitrideMOTOROLA INC·Filed 1989·Granted Sep 11, 1990·53 cites·17 claims
- 1078US5037777AMethod for forming a multi-layer semiconductor device using selective planarizationMOTOROLA INC·Filed 1990·Granted Aug 6, 1991·69 cites·13 claims
- 1157US5665620AMethod for forming concurrent top oxides using reoxidized silicon in an EPROMMOTOROLA INC·Filed 1994·Granted Sep 9, 1997·19 cites·20 claims
- 1244US4717588AMetal redistribution by rapid thermal processingMOTOROLA INC·Filed 1985·Granted Jan 5, 1988·12 cites·10 claims
Join the waitlist — get patent alerts
Get an alert when Wayne M. Paulson files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →