Inventor · disambiguated record
Wayne R. Poff
Also filed as: POFF WAYNE R
2 granted patents·9 citations·filing 1980–1988
54Inventor score
Technology areasC23F
Top patents by PatentIndex Score
2 records- 0140US4849066AMethod for selectively etching integral cathode substrate and support utilizing increased etchant turbulenceRCA LICENSING CORP·Filed 1988·Granted Jul 18, 1989·6 cites·7 claims
- 0230US4441957AMethod for selectively etching integral cathode substrate and supportRCA CORP·Filed 1980·Granted Apr 10, 1984·3 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →