Inventor · disambiguated record
Wakako Suganuma
Also filed as: SUGANUMA WAKAKO
1 granted patent·1 pending application·7 citations·filing 2001–2002
29Inventor score
Technology areasG03F
Files withNIKON CORP2
Top patents by PatentIndex Score
2 records- 0160US6972417B2Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electronsNIKON CORP·Filed 2001·Granted Dec 6, 2005·7 cites·17 claims
- 0228US2003043358A1Methods for determining focus and astigmatism in charged-particle-beam microlithographyNIKON CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →