Inventor · disambiguated record
Wen-Li Cheng
Also filed as: CHENG WEN-LI
21 granted patents·148 citations·filing 2012–2023
94Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD15TAIWAN SEMICONDUCTOR MFG4CHIANG CHIA-PING1TSAI CHENG-LUNG1
Top patents by PatentIndex Score
21 records- 0198US9679100B2Environmental-surrounding-aware OPCTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 13, 2017·20 cites·20 claims
- 0295US9176373B2System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patternsTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 3, 2015·11 cites·20 claims
- 0393US9026971B1Multi-patterning conflict free integrated circuit designTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 5, 2015·26 cites·20 claims
- 0492US8527916B1Dissection splitting with optical proximity correction to reduce corner roundingCHIANG CHIA-PING·Filed 2012·Granted Sep 3, 2013·38 cites·18 claims
- 0591US10274829B2Multiple patterning decomposition and manufacturing methods for ICTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·5 cites·20 claims
- 0691US8751976B2Pattern recognition for integrated circuit designTSAI CHENG-LUNG·Filed 2012·Granted Jun 10, 2014·28 cites·18 claims
- 0787US12159092B2Method for coloring circuit layout and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 3, 2024·0 cites·20 claims
- 0884US10817635B2Multiple patterning method for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 27, 2020·3 cites·20 claims
- 0984US9165095B2Target point generation for optical proximity correctionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 20, 2015·4 cites·20 claims
- 1083US9390223B2Method of determining whether a layout is colorableTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted Jul 12, 2016·2 cites·20 claims
- 1182US10276394B2Hybrid double patterning method for semiconductor manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Apr 30, 2019·2 cites·20 claims
- 1282US9911606B2Mandrel spacer patterning in multi-pitch integrated circuit manufacturingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 6, 2018·3 cites·20 claims
- 1382US9189588B2Polygon-based optical proximity correctionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Nov 17, 2015·3 cites·20 claims
- 1480US10078718B2Multiple patterning method for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Sep 18, 2018·3 cites·17 claims
- 1576US11790145B2Method for coloring circuit layout and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 17, 2023·0 cites·20 claims
- 1675US11392742B2Method for coloring circuit layout and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 19, 2022·0 cites·20 claims
- 1771US10796055B2Method for coloring circuit layout and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 6, 2020·0 cites·20 claims
- 1865US10770304B2Hybrid double patterning method for semiconductor manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Sep 8, 2020·0 cites·20 claims
- 1964US10509881B2Method for coloring circuit layout and system for performing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 17, 2019·0 cites·20 claims
- 2064US10483120B2Hybrid double patterning method for semiconductor manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Nov 19, 2019·0 cites·20 claims
- 2157US10036948B2Environmental-surrounding-aware OPCTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 31, 2018·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →