Inventor · disambiguated record
Weimin Han
Also filed as: HAN WEIMIN · HAN WEIMIN C
5 granted patents·10 pending applications·33 citations·filing 1997–2024
75Inventor score
Top patents by PatentIndex Score
15 records- 0181US11276760B2Non-planar semiconductor device having omega-fin with doped sub-fin region and method to fabricate sameINTEL CORP·Filed 2019·Granted Mar 15, 2022·2 cites·7 claims
- 0276US8676302B2Systems and methods for multi-spectral bioluminescence tomographyWANG GE·Filed 2007·Granted Mar 18, 2014·22 cites·15 claims
- 0365US2022130962A1Non-planar semiconductor device having omega-fin with doped sub-fin region and method to fabricate sameINTEL CORP·Filed 2022·Application pending·0 cites
- 0458US2025261408A1Layered thin film materials for transistor channelsINTEL CORP·Filed 2024·Application pending·0 cites
- 0557US2025218868A1Self-aligned interconnect features with floating dielectric structureINTEL CORP·Filed 2023·Application pending·0 cites
- 0656US2024324167A1Architectures and methods for computation in memory (cim) with backside memory using high performance (hp) thin film transistor (tft) materialINTEL CORP·Filed 2023·Application pending·0 cites
- 0755US10355093B2Non-planar semiconductor device having omega-fin with doped sub-fin region and method to fabricate sameINTEL CORP·Filed 2014·Granted Jul 16, 2019·0 cites·27 claims
- 0853US2025006812A1N-type transistor fabrication in complementary fet (cfet) devicesINTEL CORP·Filed 2023·Application pending·0 cites
- 0947US2024006512A1In-situ multi-layer dielectric films for application as gate spacer and etch stop layersINTEL CORP·Filed 2022·Application pending·0 cites
- 1043US2017162693A1Apparatus and methods to create microelectronic device isolation by catalytic oxide formationINTEL CORP·Filed 2014·Application pending·0 cites
- 1140US6140251AMethod of processing a substrateINTEL CORP·Filed 1997·Granted Oct 31, 2000·9 cites·24 claims
- 1239US11482433B2Stacked thermal processing chamber modules for remote radiative heating in semiconductor device manufactureINTEL CORP·Filed 2020·Granted Oct 25, 2022·0 cites·12 claims
- 1339US2014175566A1Converting a high dielectric spacer to a low dielectric spacerBHIMARASETTI GOPINATH·Filed 2012·Application pending·0 cites
- 1431US2004152287A1Deposition of a silicon filmFiled 2003·Application pending·0 cites
- 1531US2002127763A1Sidewall spacers and methods of making sameFiled 2000·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Weimin Han files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →