Inventor · disambiguated record
Wei-Han Lai
Also filed as: LAI WEI-HAN
53 granted patents·31 pending applications·77 citations·filing 2013–2025
97Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD74ASUS TECHNOLOGY LICENSING INC5ACOUSTICSHEEP LLC1ADVANCED SEMICONDUCTOR ENG1IND TECH RES INST1
Top patents by PatentIndex Score
84 records- 0197US11935757B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 19, 2024·2 cites·20 claims
- 0296US9459536B1Negative tone developer composition for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 4, 2016·14 cites·20 claims
- 0395US9921480B2Extreme ultraviolet photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Mar 20, 2018·7 cites·20 claims
- 0494US10520813B2Extreme ultraviolet photoresist with high-efficiency electron transferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 31, 2019·4 cites·19 claims
- 0593US11955336B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 9, 2024·2 cites·20 claims
- 0692US11728161B2Spin on carbon composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 15, 2023·1 cites·20 claims
- 0791US11269256B2Underlayer material for photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 8, 2022·2 cites·20 claims
- 0889US11422465B2Extreme ultraviolet photoresist with high-efficiency electron transferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 23, 2022·2 cites·20 claims
- 0989US10365561B2Photoresist and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 30, 2019·2 cites·20 claims
- 1088US9581908B2Photoresist and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Feb 28, 2017·7 cites·19 claims
- 1187US12300507B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted May 13, 2025·0 cites·20 claims
- 1287US10698317B2Underlayer material for photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 30, 2020·3 cites·20 claims
- 1387US2024376303A1Photoresist composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1487US2025362606A1Crosslinkable photoresist for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1586US9958779B2Photoresist additive for outgassing reduction and out-of-band radiation absorptionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted May 1, 2018·4 cites·20 claims
- 1685US10056256B2Method of priming photoresist before application of a shrink material in a lithography processTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 21, 2018·4 cites·20 claims
- 1784US11476108B2Spin on carbon composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 18, 2022·1 cites·20 claims
- 1884US11106138B2Lithography process and material for negative tone developmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 31, 2021·2 cites·20 claims
- 1984US2025093775A1Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2083US2024395539A1Spin on carbon composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2182US12347683B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 1, 2025·0 cites·20 claims
- 2282US12148610B2Spin on carbon composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 19, 2024·0 cites·20 claims
- 2382US10095113B2Photoresist and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Oct 9, 2018·2 cites·20 claims
- 2482US2025364244A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2581US12189287B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 7, 2025·0 cites·20 claims
- 2681US2025285864A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2781US2025362613A1Composition and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2880US11809080B2Extreme ultraviolet photoresist with high-efficiency electron transferTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 7, 2023·0 cites·20 claims
- 2980US11626293B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 11, 2023·0 cites·20 claims
- 3080US10163632B2Material composition and process for substrate modificationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·2 cites·20 claims
- 3180US9924271B2Functional headwearACOUSTICSHEEP LLC·Filed 2014·Granted Mar 20, 2018·10 cites·38 claims
- 3279US10163648B2Method of semiconductor device fabrication having application of material with cross-linkable componentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 25, 2018·2 cites·20 claims
- 3379US2025362604A1Thiol-containing photoresist compositions for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3478US9488913B2Photoresist having decreased outgassingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Nov 8, 2016·2 cites·20 claims
- 3578US2025116932A1Thiol-containing photoresist compositions for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3676US11796918B2Underlayer material for photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 24, 2023·0 cites·20 claims
- 3776US2023142787A1Negative tone photoresist for euv lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3876US2025095988A1Coating composition for photolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3976US2025093779A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4075US12189296B2Lithography process and material for negative tone developmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 4174US12134690B2Photoresist composition and method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 5, 2024·0 cites·20 claims
- 4274US2022365430A1Negative tone photoresist for euv lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 4374US2024371640A1Underlayer of multilayer structure and methods of use thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4472US10114286B2Photoresist and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 30, 2018·1 cites·20 claims
- 4572US2025138428A1Lithography Process and Material for Negative Tone DevelopmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 4671US11714355B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 1, 2023·0 cites·20 claims
- 4771US11073763B2Photoresist and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 27, 2021·0 cites·20 claims
- 4871US2023350295A1Crosslinkable photoresist for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 4970US12476107B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Nov 18, 2025·0 cites·20 claims
- 5070US11550220B2Negative tone photoresist for EUV lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jan 10, 2023·0 cites·20 claims
Showing the top 50 of 84 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →