Inventor · disambiguated record
Wei-Fan Lee
Also filed as: LEE WEI-FAN
7 granted patents·1 pending application·3 citations·filing 2014–2025
74Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD8
Top patents by PatentIndex Score
8 records- 0180US11600728B2Method of manufacturing a facet-free source/drain epitaxial structure having an amorphous or polycrystalline layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Mar 7, 2023·1 cites·20 claims
- 0280US2025318177A1Semiconductor structure having a source/drain epitaxial stack with a non-crystalline layer thereinTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0379US12513938B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Dec 30, 2025·0 cites·20 claims
- 0473US12396203B2Semiconductor structure having a source/drain epitaxial stack with a non-crystalline layer thereinTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 0569US12021144B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 25, 2024·0 cites·20 claims
- 0662US9721827B2Semiconductor arrangement with stress control and method of makingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 1, 2017·2 cites·20 claims
- 0759US11222980B2Method of manufacturing a semiconductor device and a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jan 11, 2022·0 cites·20 claims
- 0842US9595593B2Semiconductor structure with interfacial layer and method for manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 14, 2017·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →