Inventor · disambiguated record
Wen-Chuan Wang
Also filed as: WANG WEN-CHUAN
65 granted patents·9 pending applications·388 citations·filing 2000–2024
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG28TAIWAN SEMICONDUCTOR MFG CO LTD21CHUNGHWA PICTURE TUBES LTD6WANG WEN CHUAN4CHANG SHIH-MING2
Top patents by PatentIndex Score
74 records- 0198US8828632B2Multiple-grid exposure methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 9, 2014·26 cites·20 claims
- 0297US9810994B2Systems and methods for high-throughput and small-footprint scanning exposure for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 7, 2017·8 cites·20 claims
- 0397US8846278B2Electron beam lithography system and method for improving throughputTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 30, 2014·26 cites·14 claims
- 0497US8822106B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 2, 2014·31 cites·22 claims
- 0597US8584057B2Non-directional dithering methodsLiu pei-yi·Filed 2012·Granted Nov 12, 2013·33 cites·20 claims
- 0697US8510687B1Error diffusion and grid shift in lithographyLiu pei-yi·Filed 2012·Granted Aug 13, 2013·32 cites·20 claims
- 0796US8530121B2Multiple-grid exposure methodWANG WEN CHUAN·Filed 2012·Granted Sep 10, 2013·37 cites·20 claims
- 0896US8524427B2Electron beam lithography system and method for improving throughputSHIN JAW-JUNG·Filed 2011·Granted Sep 3, 2013·30 cites·20 claims
- 0995US9594862B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 14, 2017·19 cites·16 claims
- 1095US7383530B2System and method for examining mask pattern fidelityTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 3, 2008·27 cites·12 claims
- 1190US9436788B2Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 6, 2016·11 cites·19 claims
- 1290US9436787B2Method of fabricating an integrated circuit with optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 6, 2016·11 cites·20 claims
- 1390US8227150B2Holographic reticle and patterning methodCHANG SHIH-MING·Filed 2010·Granted Jul 24, 2012·6 cites·20 claims
- 1489US11061317B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 13, 2021·4 cites·20 claims
- 1588US9329488B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted May 3, 2016·2 cites·20 claims
- 1687US10170276B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 1, 2019·3 cites·20 claims
- 1787US8972908B2Method for electron beam proximity correction with improved critical dimension accuracyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 3, 2015·10 cites·20 claims
- 1886US10495982B2System and method for real-time overlay error reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Dec 3, 2019·4 cites·21 claims
- 1985US8822107B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 2, 2014·5 cites·25 claims
- 2084US8368037B2Systems and methods providing electron beam writing to a mediumTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Feb 5, 2013·4 cites·11 claims
- 2181US7796249B2Mask haze early detectionTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Sep 14, 2010·5 cites·20 claims
- 2280US10811225B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 20, 2020·1 cites·20 claims
- 2380US6721939B2Electron beam shot linearity monitoringTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Apr 13, 2004·15 cites·20 claims
- 2479US10431423B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·1 cites·20 claims
- 2578US9792869B1Display panelCHUNGHWA PICTURE TUBES LTD·Filed 2016·Granted Oct 17, 2017·3 cites·10 claims
- 2678US9589764B2Electron beam lithography process with multiple columnsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·2 cites·20 claims
- 2777US9176389B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Nov 3, 2015·2 cites·20 claims
- 2874US7819980B2System and method for removing particles in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Oct 26, 2010·4 cites·19 claims
- 2973US10008171B2Gate driving circuit with isolating switch for display device using the sameCHUNGHWA PICTURE TUBES LTD·Filed 2016·Granted Jun 26, 2018·2 cites·11 claims
- 3071US8610083B2Systems and methods providing electron beam writing to a mediumTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 17, 2013·1 cites·20 claims
- 3171US7759136B2Critical dimension (CD) control by spectrum metrologyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 20, 2010·4 cites·16 claims
- 3270US12429776B2Lithography method with reduced impacts of mask defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 30, 2025·0 cites·20 claims
- 3370US10359695B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 23, 2019·1 cites·20 claims
- 3470US8758963B2Holographic reticle and patterning methodCHANG SHIH-MING·Filed 2012·Granted Jun 24, 2014·1 cites·20 claims
- 3563US12283215B2Display device and driving method thereofE INK HOLDINGS INC·Filed 2024·Granted Apr 22, 2025·0 cites·9 claims
- 3663US9529271B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 27, 2016·0 cites·20 claims
- 3763US8927947B2Systems and methods providing electron beam writing to a mediumTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 6, 2015·0 cites·20 claims
- 3863US7697114B2Method and apparatus for compensated illumination for advanced lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Apr 13, 2010·1 cites·26 claims
- 3961US9761411B2System and method for maskless direct write lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 12, 2017·1 cites·20 claims
- 4061US9678434B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 13, 2017·0 cites·20 claims
- 4161US9229332B2Systems and methods for high-throughput and small-footprint scanning exposure for lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jan 5, 2016·0 cites·25 claims
- 4261US7824316B2Punching bagARMORLINK SH CORP·Filed 2009·Granted Nov 2, 2010·3 cites·2 claims
- 4361US2024304119A1Electronic paper display device and flexible substrate for electronic paper display device having frameE INK HOLDINGS INC·Filed 2024·Application pending·0 cites
- 4460US9552964B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 24, 2017·0 cites·21 claims
- 4560US8852849B2Electron beam lithography system and method for improving throughputTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Oct 7, 2014·0 cites·20 claims
- 4659US10955746B2Lithography method with reduced impacts of mask defectsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Mar 23, 2021·0 cites·20 claims
- 4758US9519225B2Systems and methods for high-throughput and small-footprint scanning exposure for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 13, 2016·0 cites·20 claims
- 4858US7722997B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 25, 2010·0 cites·13 claims
- 4957US7312021B2Holographic reticle and patterning methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Dec 25, 2007·3 cites·15 claims
- 5057US7060400B2Method to improve photomask critical dimension uniformity and photomask fabrication processTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 13, 2006·5 cites·26 claims
Showing the top 50 of 74 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →