Inventor · disambiguated record
Wei E. Wu
Also filed as: WU WEI · WU WEI E · WU WEI EDWIN
9 granted patents·1 pending application·460 citations·filing 1997–2006
89Inventor score
Top patents by PatentIndex Score
10 records- 0197US6171910B1Method for forming a semiconductor deviceMOTOROLA INC·Filed 1999·Granted Jan 9, 2001·271 cites·16 claims
- 0292US6902969B2Process for forming dual metal gate structuresFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Jun 7, 2005·78 cites·24 claims
- 0390US6232134B1Method and apparatus for monitoring wafer characteristics and/or semiconductor processing consistency using wafer charge distribution measurementsMOTOROLA INC·Filed 2000·Granted May 15, 2001·58 cites·40 claims
- 0477US6146948AMethod for manufacturing a thin oxide for use in semiconductor integrated circuitsMOTOROLA INC·Filed 1997·Granted Nov 14, 2000·42 cites·30 claims
- 0555US6818362B1Photolithography reticle designFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Nov 16, 2004·4 cites·22 claims
- 0654US6969568B2Method for etching a quartz layer in a photoresistless semiconductor maskFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Nov 29, 2005·4 cites·20 claims
- 0752US6797440B2Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor deviceFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Sep 28, 2004·3 cites·22 claims
- 0841US7732102B2Cr-capped chromeless phase lithographyFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Jun 8, 2010·0 cites·15 claims
- 0939US2007243491A1Method of making a semiconductor with a high transmission CVD silicon nitride phase shift maskWU WEI E·Filed 2006·Application pending·0 cites
- 1038US7018747B2Photomask having line end phase anchorsFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Mar 28, 2006·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →