Inventor · disambiguated record
Wilfried Lerch
Also filed as: LERCH WILFRIED
15 granted patents·5 pending applications·211 citations·filing 1996–2016
92Inventor score
Files withCENTROTHERM THERMAL SOLUTIONS GMBH & CO KG3LERCH WILFRIED3STEAG RTP SYSTEMS GMBH3CENTROTHERM PHOTOVOLTAICS AG2PEUSE BRUCE W2
Top patents by PatentIndex Score
20 records- 0186US8236706B2Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structuresPEUSE BRUCE W·Filed 2008·Granted Aug 7, 2012·14 cites·11 claims
- 0283US7977258B2Method and system for thermally processing a plurality of wafer-shaped objectsMATTSON TECH INC·Filed 2007·Granted Jul 12, 2011·11 cites·69 claims
- 0380US5727017AMethod and apparatus for determining emissivity of semiconductor materialAST ELECTRONIK GMBH·Filed 1996·Granted Mar 10, 1998·77 cites·6 claims
- 0474US6953338B2Device for thermal treatment of substratesSTEAG RTP SYSTEMS GMBH·Filed 2001·Granted Oct 11, 2005·23 cites·23 claims
- 0568US8716153B2Device and method for producing dielectric layers in microwave plasmaLERCH WILFRIED·Filed 2009·Granted May 6, 2014·3 cites·14 claims
- 0664US10867825B2Wafer boat and treatment apparatus for wafersLERCH WILFRIED·Filed 2016·Granted Dec 15, 2020·2 cites·17 claims
- 0763US6561694B1Method and device for calibrating measurements of temperatures independent of emissivitySTEAG RTP SYSTEMS GMBH·Filed 1999·Granted May 13, 2003·30 cites·29 claims
- 0861US6830631B2Method for the removing of adsorbed molecules from a chamberSTEAG RTP SYSTEMS GMBH·Filed 2002·Granted Dec 14, 2004·8 cites·18 claims
- 0959US9805993B2Device for determining the temperature of a substrateCENTROTHERM THERMAL SOLUTIONS GMBH & CO KG·Filed 2013·Granted Oct 31, 2017·2 cites·16 claims
- 1057US6100149AMethod for rapid thermal processing (RTP) of silicon substratesSTEAG RTP SYSTEMS·Filed 1997·Granted Aug 8, 2000·17 cites·17 claims
- 1153US9252011B2Method for forming a layer on a substrate at low temperaturesNIESS JUERGEN·Filed 2012·Granted Feb 2, 2016·1 cites·10 claims
- 1251US9711388B2Substrate holder and a device and a method for treating substratesCENTROTHERM THERMAL SOLUTIONS GMBH & CO KG·Filed 2013·Granted Jul 18, 2017·1 cites·18 claims
- 1350US5935650AMethod of oxidation of semiconductor wafers in a rapid thermal processing (RTP) systemFiled 1997·Granted Aug 10, 1999·22 cites·13 claims
- 1445US2012298039A1Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structuresPEUSE BRUCE W·Filed 2012·Application pending·0 cites
- 1541US2016217982A1Method and device for detecting a plasma ignitionCENTROTHERM PHOTOVOLTAICS AG·Filed 2014·Application pending·0 cites
- 1634US2018366352A1Method and device for the thermal treatment of substrates and holding unit for substratesCENTROTHERM INT AG·Filed 2016·Application pending·0 cites
- 1732US9612158B2Device for determining the temperature of a substrateCENTROTHERM THERMAL SOLUTIONS GMBH & CO KG·Filed 2012·Granted Apr 4, 2017·0 cites·13 claims
- 1832US6809011B2Adjusting of defect profiles in crystal or crystalline-like structuresMATTSON THERMAL PRODUCTS GMBH·Filed 2001·Granted Oct 26, 2004·0 cites·54 claims
- 1923US2018076070A1Plasma-treatment device for wafersLERCH WILFRIED·Filed 2016·Application pending·0 cites
- 2023US2018066354A1Wafer boat and plasma treatment device for wafersCENTROTHERM PHOTOVOLTAICS AG·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →