Inventor · disambiguated record
William T. Rericha
Also filed as: RERICHA WILLIAM · RERICHA WILLIAM T
25 granted patents·1 pending application·1,171 citations·filing 1995–2014
97Inventor score
Top patents by PatentIndex Score
26 records- 0199US7115525B2Method for integrated circuit fabrication using pitch multiplicationMICRON TECHNOLOGY INC·Filed 2004·Granted Oct 3, 2006·517 cites·16 claims
- 0298US7253118B2Pitch reduced patterns relative to photolithography featuresMICRON TECHNOLOGY INC·Filed 2005·Granted Aug 7, 2007·161 cites·52 claims
- 0397US7687408B2Method for integrated circuit fabrication using pitch multiplicationMICRON TECHNOLOGY INC·Filed 2007·Granted Mar 30, 2010·42 cites·33 claims
- 0497US7651951B2Pitch reduced patterns relative to photolithography featuresMICRON TECHNOLOGY INC·Filed 2007·Granted Jan 26, 2010·46 cites·28 claims
- 0597US7547640B2Method for integrated circuit fabrication using pitch multiplicationMICRON TECHNOLOGY INC·Filed 2006·Granted Jun 16, 2009·49 cites·39 claims
- 0697US7455956B2Method to align mask patternsMICRON TECHNOLOGY INC·Filed 2007·Granted Nov 25, 2008·41 cites·25 claims
- 0796US7435536B2Method to align mask patternsMICRON TECHNOLOGY INC·Filed 2006·Granted Oct 14, 2008·29 cites·28 claims
- 0895US7718540B2Pitch reduced patterns relative to photolithography featuresROUND ROCK RES LLC·Filed 2007·Granted May 18, 2010·22 cites·5 claims
- 0995US7629693B2Method for integrated circuit fabrication using pitch multiplicationMICRON TECHNOLOGY INC·Filed 2006·Granted Dec 8, 2009·20 cites·14 claims
- 1094US8048812B2Pitch reduced patterns relative to photolithography featuresROUND ROCK RES LLC·Filed 2010·Granted Nov 1, 2011·11 cites·20 claims
- 1193US8207576B2Pitch reduced patterns relative to photolithography featuresTRAN LUAN·Filed 2007·Granted Jun 26, 2012·18 cites·25 claims
- 1292US8598632B2Integrated circuit having pitch reduced patterns relative to photoithography featuresTRAN LUAN·Filed 2012·Granted Dec 3, 2013·10 cites·6 claims
- 1391US8216949B2Method for integrated circuit fabrication using pitch multiplicationABATCHEV MIRZAFER K·Filed 2010·Granted Jul 10, 2012·10 cites·18 claims
- 1489US6784975B2Method and apparatus for irradiating a microlithographic substrateMICRON TECHNOLOGY INC·Filed 2001·Granted Aug 31, 2004·28 cites·70 claims
- 1588US8119535B2Pitch reduced patterns relative to photolithography featuresTRAN LUAN·Filed 2009·Granted Feb 21, 2012·8 cites·19 claims
- 1687US8674512B2Method to align mask patternsMICRON TECHNOLOGY INC·Filed 2012·Granted Mar 18, 2014·5 cites·21 claims
- 1787US7038762B2Method and apparatus for irradiating a microlithographic substrateMICRON TECHNOLOGY INC·Filed 2004·Granted May 2, 2006·21 cites·22 claims
- 1883US7655387B2Method to align mask patternsMICRON TECHNOLOGY INC·Filed 2004·Granted Feb 2, 2010·19 cites·17 claims
- 1981US8338085B2Method to align mask patternsSANDHU GURTEJ S·Filed 2009·Granted Dec 25, 2012·4 cites·20 claims
- 2080US7298453B2Method and apparatus for irradiating a microlithographic substrateMICRON TECHNOLOGY INC·Filed 2006·Granted Nov 20, 2007·4 cites·19 claims
- 2176US8657597B2Templates for use in imprint lithography and related intermediate template structuresSANDHU GURTEJ S·Filed 2010·Granted Feb 25, 2014·2 cites·7 claims
- 2276US5925410AVibration-enhanced spin-on film techniques for semiconductor device processingMICRON TECHNOLOGY INC·Filed 1997·Granted Jul 20, 1999·47 cites·34 claims
- 2375US5849435AMethod for forming a thin uniform layer of resist for lithographyMICRON TECHNOLOGY INC·Filed 1997·Granted Dec 15, 1998·29 cites·32 claims
- 2474US7771917B2Methods of making templates for use in imprint lithographyMICRON TECHNOLOGY INC·Filed 2005·Granted Aug 10, 2010·3 cites·24 claims
- 2570US5609995AMethod for forming a thin uniform layer of resist for lithographyMICRON TECHNOLOGY INC·Filed 1995·Granted Mar 11, 1997·25 cites·32 claims
- 2661US2014147542A1Template structures including ultraviolet wavelength radiation transparent materialMICRON TECHNOLOGY INC·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →