Inventor · disambiguated record
Wontae Noh
Also filed as: NOH WONTAE
21 granted patents·11 pending applications·500 citations·filing 2011–2025
93Inventor score
Files withAIR LIQUIDE18L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude5AIR LIQUIDE AMERICAN3L AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE1L'AIR LIQUIDE SOC ANONYME POUR L'ETUDE ET I'EXPLOITATION DES PROCEDES GEORGES CLAUDE1
Top patents by PatentIndex Score
32 records- 0198US9691771B2Vanadium-containing film forming compositions and vapor deposition of vanadium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Jun 27, 2017·471 cites·20 claims
- 0294US10174423B2Niobium-containing film forming compositions and vapor deposition of Niobium-containing filmsAIR LIQUIDE·Filed 2017·Granted Jan 8, 2019·5 cites·6 claims
- 0390US10023462B2Niobium-Nitride film forming compositions and vapor deposition of Niobium-Nitride filmsAIR LIQUIDE·Filed 2015·Granted Jul 17, 2018·4 cites·16 claims
- 0489US11784041B2Preparation of lanthanide-containing precursors and deposition of lanthanide-containing filmsAIR LIQUIDE·Filed 2022·Granted Oct 10, 2023·2 cites·6 claims
- 0589US9711347B2Preparation of lanthanide-containing precursors and deposition of lanthanide-containing filmsAIR LIQUIDE AMERICAN·Filed 2016·Granted Jul 18, 2017·4 cites·29 claims
- 0687US10364259B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2016·Granted Jul 30, 2019·2 cites·21 claims
- 0787US9518075B2Group 5 cyclopentadienyl transition metal-containing precursors for deposition of group 5 transition metal-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2013·Granted Dec 13, 2016·3 cites·20 claims
- 0885US8809849B2Preparation of cerium-containing precursors and deposition of cerium-containing filmsAIR LIQUIDE AMERICAN·Filed 2013·Granted Aug 19, 2014·4 cites·11 claims
- 0981US9786671B2Niobium-containing film forming compositions and vapor deposition of niobium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Oct 10, 2017·2 cites·19 claims
- 1077US9384963B2Preparation of cerium-containing precursor and deposition of cerium-containing filmsAIR LIQUIDE AMERICAN·Filed 2014·Granted Jul 5, 2016·2 cites·20 claims
- 1177US2025369115A1Method of forming dielectric films, new precursors and their use in the semi-conductor manufacturingAIR LIQUIDE·Filed 2025·Application pending·0 cites
- 1271US2020032397A1Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2019·Application pending·0 cites
- 1370US12398275B2Group V element-containing film compositions and vapor deposition of Group V element-containing filmAIR LIQUIDE·Filed 2019·Granted Aug 26, 2025·0 cites·17 claims
- 1469US2025034181A1Silicon-containing group 4 precursors and deposition of metal-containing filmsAIR LIQUIDE·Filed 2024·Application pending·0 cites
- 1567US11242597B2Lanthanide precursors and deposition of lanthanide-containing films using the sameAIR LIQUIDE·Filed 2020·Granted Feb 8, 2022·0 cites·10 claims
- 1667US10895012B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameLAIR LIQUIDE SA POUR LETUDE ET LEXPLOITATION DES PROCEDES GEROGES CLAUDE·Filed 2019·Granted Jan 19, 2021·0 cites·17 claims
- 1767US10337104B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2016·Granted Jul 2, 2019·0 cites·20 claims
- 1866US12371787B2Method of forming dielectric films, new precursors and their use in the semi-conductor manufacturingAIR LIQUIDE·Filed 2020·Granted Jul 29, 2025·0 cites·10 claims
- 1965US10465289B2Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2016·Granted Nov 5, 2019·0 cites·9 claims
- 2065US10106887B2Group 5 transition metal-containing compounds for vapor deposition of group 5 transition metal-containing filmsAIR LIQUIDE·Filed 2013·Granted Oct 23, 2018·1 cites·12 claims
- 2165US2025223696A1Group 2 metal containing film forming compositions and vapor deposition of the films using the sameLAIR LIQUIDE SA POUR LETUDE ET L’EXPLOITATION DES PROCEDES GEORGES CLAUDE·Filed 2024·Application pending·0 cites
- 2261US2017107612A1Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameL'AIR LIQUIDE SOC ANONYME POUR L'ETUDE ET I'EXPLOITATION DES PROCEDES GEORGES CLAUDE·Filed 2016·Application pending·0 cites
- 2360US2020149165A1Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the sameAIR LIQUIDE·Filed 2020·Application pending·0 cites
- 2458US2023323530A1Niobium, vanadium, tantalum film forming compositions and deposition of group v (five) containing films using the sameLAIR LIQUIDE SA POUR LETUDE ET LEXPLOITATATION DES PROCEDES GEORGES CLAUDE·Filed 2022·Application pending·0 cites
- 2556US12312677B2Step coverage using an inhibitor molecule for high aspect ratio structuresAIR LIQUIDE·Filed 2020·Granted May 27, 2025·0 cites·15 claims
- 2656US9748249B2Tantalum-containing film forming compositions and vapor deposition of tantalum-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Aug 29, 2017·0 cites·19 claims
- 2756US9691770B2Vanadium-containing film forming compositions and vapor deposition of vanadium-containing filmsL'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude·Filed 2016·Granted Jun 27, 2017·0 cites·19 claims
- 2855US2022205099A1Group iv element containing precursors and deposition of group iv element containing filmsAIR LIQUIDE·Filed 2020·Application pending·0 cites
- 2954US2018187303A1Lanthanide precursors and deposition of lanthanide-containing films using the sameAIR LIQUIDE·Filed 2016·Application pending·0 cites
- 3052US2012156373A1Preparation of cerium-containing precursors and deposition of cerium-containing filmsPALLEM VENKATESWARA R·Filed 2011·Application pending·0 cites
- 3151US11319449B2Area selective deposition of metal containing filmsAIR LIQUIDE·Filed 2019·Granted May 3, 2022·0 cites·20 claims
- 3236US2016083405A1Tantalum- or vanadium-containing film forming compositions and vapor deposition of tantalum- or vanadium-containing filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →