Inventor · disambiguated record
Xing Yu
Also filed as: YU XING · YU XING-JIE
11 granted patents·1 pending application·159 citations·filing 1999–2021
90Inventor score
Top patents by PatentIndex Score
12 records- 0176US7969543B2Retardation films having single retardation value with variationUNIV HONG KONG SCIENCE & TECHN·Filed 2007·Granted Jun 28, 2011·4 cites·5 claims
- 0274US6090691AMethod for forming a raised source and drain without using selective epitaxial growthCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Jul 18, 2000·46 cites·30 claims
- 0370US6376319B2Process to fabricate a source-drain extensionCHARTERED SEMICONDUCTOR MFG·Filed 2001·Granted Apr 23, 2002·13 cites·9 claims
- 0470US6096647AMethod to form CoSi2 on shallow junction by Si implantationCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Aug 1, 2000·32 cites·25 claims
- 0569US6218234B1Dual gate and double poly capacitor analog process integrationCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Apr 17, 2001·32 cites·23 claims
- 0660US6319783B1Process to fabricate a novel source-drain extensionCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Nov 20, 2001·16 cites·10 claims
- 0751US6455384B2Method for forming MOSFET device having source/drain extension regions located underlying L shaped spacersCHARTERED SEMICONDUCTOR MFG·Filed 2001·Granted Sep 24, 2002·4 cites·7 claims
- 0847US7557884B2Bistable liquid crystal deviceUNIV HONG KONG SCIENCE & TECHN·Filed 2004·Granted Jul 7, 2009·2 cites·17 claims
- 0945US6100161AMethod of fabrication of a raised source/drain transistorCHARTERED SEMICONDUCTOR MFG·Filed 1999·Granted Aug 8, 2000·10 cites·14 claims
- 1043US2024244833A1Dynamic random access memory and forming method thereforICLEAGUE TECH CO LTD·Filed 2021·Application pending·0 cites
- 1139US7236219B2Color twisted nematic liquid crystal displaysUNIV HONG KONG SCIENCE & TECHN·Filed 2003·Granted Jun 26, 2007·0 cites·4 claims
- 1238US6919947B2Color vertically aligned liquid crystal displaysUNIV HONG KONG SCIENCE & TECHN·Filed 2003·Granted Jul 19, 2005·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →