Inventor · disambiguated record
Yahru Cheng
Also filed as: CHENG YAHRU
29 granted patents·20 pending applications·29 citations·filing 2018–2025
94Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD49
Top patents by PatentIndex Score
49 records- 0198US11705332B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jul 18, 2023·9 cites·20 claims
- 0295US12057315B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 6, 2024·2 cites·20 claims
- 0395US11822237B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 21, 2023·3 cites·20 claims
- 0493US12159787B2Method of manufacturing a semiconductor device and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 3, 2024·2 cites·20 claims
- 0593US12135501B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Nov 5, 2024·1 cites·20 claims
- 0693US12002675B2Photoresist layer outgassing preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 4, 2024·2 cites·20 claims
- 0793US11029602B2Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 8, 2021·4 cites·20 claims
- 0892US11971657B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Apr 30, 2024·1 cites·20 claims
- 0992US2025362598A1Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1089US11901189B2Ambient controlled two-step thermal treatment for spin-on coating layer planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 13, 2024·2 cites·20 claims
- 1186US12487527B2Photoresist developer and method of developing photoresistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Dec 2, 2025·0 cites·20 claims
- 1286US12374548B2Photoresist layer outgassing preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jul 29, 2025·0 cites·20 claims
- 1386US10529552B2Method for manufacturing a semiconductor device and a coating materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jan 7, 2020·1 cites·19 claims
- 1484US2025323038A1Photoresist layer outgassing preventionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 1581US12463034B2Photoresist layer surface treatment, cap layer, and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Nov 4, 2025·0 cites·20 claims
- 1678US12354874B2Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 8, 2025·0 cites·20 claims
- 1778US12013641B2Method of reducing undesired light influence in extreme ultraviolet exposureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 18, 2024·0 cites·20 claims
- 1877US2024363722A1Air spacer formation with a spin-on dielectric materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1977US2025147417A1Method of manufacturing a semiconductor device and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2077US2025359292A1Gate Patterning for Stacked Device StructureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2176US12094952B2Air spacer formation with a spin-on dielectric materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 17, 2024·0 cites·20 claims
- 2276US2025349535A1Semiconductor Device Having Dielectric Material Treated with Microwave Plasma and Method of Fabricating ThereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2376US2025299955A1Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2475US2025351547A1Semiconductor Device and Method of Fabricating ThereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2575US2024385514A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2674US12222643B2Method of manufacturing a semiconductor device and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 11, 2025·0 cites·20 claims
- 2774US2024387188A1Ambient controlled two-step thermal treatment for spin-on coating layer planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2873US12272554B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Apr 8, 2025·0 cites·20 claims
- 2972US10768527B2Resist solvents for photolithography applicationsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 8, 2020·1 cites·20 claims
- 3071US12087592B2Ambient controlled two-step thermal treatment for spin-on coating layer planarizationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Sep 10, 2024·0 cites·20 claims
- 3171US11003082B2Method for forming semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 11, 2021·1 cites·20 claims
- 3271US2023384669A1Photoresist materials and associated methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3370US2021294212A1Photoresist composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
- 3470US2025246430A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3569US2025140553A1Semiconductor Device Having Dielectric Material Treated with Microwave Plasma and Method of Fabricating ThereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3668US11626482B2Air spacer formation with a spin-on dielectric materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 11, 2023·0 cites·20 claims
- 3768US2025159966A1Semiconductor Device and Method of Fabricating ThereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3868US2024321640A1Gate Patterning for Stacked Device StructureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3967US11703762B2Method of reducing undesired light influence in extreme ultraviolet exposureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 18, 2023·0 cites·20 claims
- 4062US2022365428A1Photoresist materials and associated methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Application pending·0 cites
- 4162US2024385523A1Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4261US11276568B2Method for manufacturing a semiconductor device and a coating materialTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 15, 2022·0 cites·20 claims
- 4359US12106961B2Humidity control or aqueous treatment for EUV metallic resistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Oct 1, 2024·0 cites·20 claims
- 4458US11942322B2Method of manufacturing semiconductor devices and pattern formation methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 26, 2024·0 cites·20 claims
- 4557US2023161240A1Manufacturing method of euv photo masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 4653US2023377883A1System and method for directed self-assembly with high boiling point solventTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 4751US11784046B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 10, 2023·0 cites·20 claims
- 4851US10770293B2Method for manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 8, 2020·0 cites·20 claims
- 4949US12271113B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 8, 2025·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →