Inventor · disambiguated record
Yasunori Doi
Also filed as: DOI YASUNORI
9 granted patents·55 citations·filing 1991–1995
87Inventor score
Files withSUMITOMO CHEMICAL CO9
Top patents by PatentIndex Score
9 records- 0167US5792585ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Aug 11, 1998·7 cites·6 claims
- 0253US5283155APositive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivativeSUMITOMO CHEMICAL CO·Filed 1991·Granted Feb 1, 1994·11 cites·10 claims
- 0349US5736292ARadiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groupsSUMITOMO CHEMICAL CO·Filed 1995·Granted Apr 7, 1998·9 cites·1 claims
- 0447US5403696ARadiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenolSUMITOMO CHEMICAL CO·Filed 1993·Granted Apr 4, 1995·7 cites·16 claims
- 0545US5407780ARadiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehydeSUMITOMO CHEMICAL CO·Filed 1994·Granted Apr 18, 1995·8 cites·21 claims
- 0642US5283324AProcess for preparing radiation sensitive compound and positive resist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Feb 1, 1994·6 cites·11 claims
- 0740US5336583APositive quinonediazide resist composition utilizing mixed solvent of ethyl lactate and 2-heptanoneSUMITOMO CHEMICAL CO·Filed 1993·Granted Aug 9, 1994·5 cites·3 claims
- 0831US6383708B1Positive resist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted May 7, 2002·1 cites·5 claims
- 0931US5783355ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1995·Granted Jul 21, 1998·1 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →