Inventor · disambiguated record
Yasuhiro Koizumi
Also filed as: KOIZUMI YASUHIRO
16 granted patents·7 pending applications·609 citations·filing 1985–2012
95Inventor score
Files withHITACHI LTD11SHINMAYWA IND LTD4DAINIPPON PRINTING CO LTD2RENESAS TECH CORP1TSUCHIYA TAKAYUKI1
Top patents by PatentIndex Score
23 records- 0193US6303932B1Method and its apparatus for detecting a secondary electron beam image and a method and its apparatus for processing by using focused charged particle beamHITACHI LTD·Filed 1998·Granted Oct 16, 2001·84 cites·19 claims
- 0292US4704348AExposure of uniform fine pattern on photoresistHITACHI LTD·Filed 1985·Granted Nov 3, 1987·130 cites·22 claims
- 0390US6863018B2Ion plating device and ion plating methodSHINMAYWA IND LTD·Filed 2001·Granted Mar 8, 2005·53 cites·15 claims
- 0490US5358806APhase shift mask, method of correcting the same and apparatus for carrying out the methodHITACHI LTD·Filed 1992·Granted Oct 25, 1994·70 cites·25 claims
- 0587US4609566AMethod and apparatus for repairing defects on a photo-mask patternHITACHI LTD·Filed 1985·Granted Sep 2, 1986·53 cites·25 claims
- 0684US6476387B1Method and apparatus for observing or processing and analyzing using a charged beamHITACHI LTD·Filed 1999·Granted Nov 5, 2002·44 cites·22 claims
- 0784US5342448AApparatus for processing a sample using a charged beam and reactive gasesHITACHI LTD·Filed 1993·Granted Aug 30, 1994·39 cites·14 claims
- 0881US7252910B2Fabrication method of semiconductor integrated circuit device and mask fabrication methodDAINIPPON PRINTING CO LTD·Filed 2004·Granted Aug 7, 2007·19 cites·21 claims
- 0980US5447614AMethod of processing a sample using a charged beam and reactive gases and system employing the sameHITACHI LTD·Filed 1994·Granted Sep 5, 1995·31 cites·8 claims
- 1076US5786112APhotomask manufacturing process and semiconductor integrated circuit device manufacturing process using the photomaskHITACHI LTD·Filed 1996·Granted Jul 28, 1998·37 cites·17 claims
- 1172US5439763AOptical mask and method of correcting the sameHITACHI LTD·Filed 1993·Granted Aug 8, 1995·24 cites·24 claims
- 1267US6579428B2Arc evaporator, method for driving arc evaporator, and ion plating apparatusSHINMAYWA IND LTD·Filed 2001·Granted Jun 17, 2003·9 cites·22 claims
- 1364US6879393B2Defect inspection apparatus for phase shift maskDAINIPPON PRINTING CO LTD·Filed 2001·Granted Apr 12, 2005·10 cites·6 claims
- 1455US6816134B2Plasma display panelHITACHI LTD·Filed 2002·Granted Nov 9, 2004·3 cites·4 claims
- 1549US6841399B2Method of manufacturing mask and method of manufacturing semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2003·Granted Jan 11, 2005·3 cites·38 claims
- 1649US2009057144A1Arc Evaporation Source and Vacuum Deposition SystemSHINMAYWA IND LTD·Filed 2006·Application pending·0 cites
- 1739US6831413B2Plasma display panelHITACHI LTD·Filed 2002·Granted Dec 14, 2004·0 cites·3 claims
- 1838US2007039545A1System and method for film formationSHINMAYWA IND LTD·Filed 2004·Application pending·0 cites
- 1937US2004130267A1Plasma display panelFiled 2003·Application pending·0 cites
- 2034US2002047816A1Plasma display panelFiled 2001·Application pending·0 cites
- 2133US2003143472A1Manufacturing method of photomaskFiled 2003·Application pending·0 cites
- 2233US2014246325A1Film-forming apparatus and film-forming methodTSUCHIYA TAKAYUKI·Filed 2012·Application pending·0 cites
- 2329US2002121861A1Plasma display panelFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →