Inventor · disambiguated record
Yasushi Sakaida
Also filed as: SAKAIDA YASUSHI
25 granted patents·5 pending applications·60 citations·filing 2004–2021
93Inventor score
Top patents by PatentIndex Score
30 records- 0183US9910354B2Resist underlayer film-forming composition and method for forming resist pattern using the sameNISSAN CHEMICAL IND LTD·Filed 2015·Granted Mar 6, 2018·4 cites·9 claims
- 0279US7842620B2Method for manufacturing semiconductor device using quadruple-layer laminateNISSAN CHEMICAL IND LTD·Filed 2007·Granted Nov 30, 2010·6 cites·10 claims
- 0377US8658341B2Pattern reversal film forming composition and method of forming reversed patternMARUYAMA DAISUKE·Filed 2010·Granted Feb 25, 2014·3 cites·13 claims
- 0476US9746764B2Mask blank and transfer maskHOYA CORP·Filed 2014·Granted Aug 29, 2017·2 cites·6 claims
- 0574US11112696B2Protective film-forming compositionNISSAN CHEMICAL CORP·Filed 2017·Granted Sep 7, 2021·2 cites·10 claims
- 0671US7727902B2Composition for forming nitride coating film for hard maskNISSAN CHEMICAL IND LTD·Filed 2004·Granted Jun 1, 2010·13 cites·2 claims
- 0767US11003078B2Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation methodNISSAN CHEMICAL CORP·Filed 2017·Granted May 11, 2021·1 cites·10 claims
- 0865US10042247B2Mask blank, method for manufacturing mask blank and transfer maskHOYA CORP·Filed 2015·Granted Aug 7, 2018·1 cites·11 claims
- 0962US9165781B2Composition for forming pattern reversal film and method for forming reversal patternSAKAIDA YASUSHI·Filed 2012·Granted Oct 20, 2015·2 cites·7 claims
- 1061US9093279B2Thin film forming composition for lithography containing titanium and siliconNAKAJIMA MAKOTO·Filed 2012·Granted Jul 28, 2015·1 cites·18 claims
- 1161US8007979B2Acrylic polymer-containing gap fill material forming composition for lithographyNISSAN CHEMICAL IND LTD·Filed 2004·Granted Aug 30, 2011·6 cites·6 claims
- 1260US10509320B2Underlying coating forming composition for lithography containing compound having protected carboxyl groupTAKEI SATOSHI·Filed 2006·Granted Dec 17, 2019·1 cites·8 claims
- 1360US7226721B2Underlayer coating forming composition for lithography containing compound having protected carboxyl groupNISSAN CHEMICAL IND LTD·Filed 2004·Granted Jun 5, 2007·15 cites·15 claims
- 1457US2023420749A1Secondary battery electrode additiveNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 1554US10684546B2Composition for forming resist underlayer filmNISSAN CHEMICAL CORP·Filed 2017·Granted Jun 16, 2020·0 cites·8 claims
- 1650US9632414B2Coating liquid to be applied to resist pattern and method for forming reverse patternNISSAN CHEMICAL IND LTD·Filed 2014·Granted Apr 25, 2017·0 cites·11 claims
- 1750US8283103B2Composition for forming resist underlayer film for lithography and production method of semiconductor deviceIMAMURA HIKARU·Filed 2008·Granted Oct 9, 2012·0 cites·11 claims
- 1850US7365023B2Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coatingNISSAN CHEMICAL IND LTD·Filed 2004·Granted Apr 29, 2008·2 cites·7 claims
- 1948US2011117746A1Coating composition and pattern forming methodNISSAN CHEMICAL IND LTD·Filed 2009·Application pending·0 cites
- 2048US2021336271A1Composition for forming thin film for energy storage device electrode, composite current collector for energy storage device electrode, energy storage device electrode, and energy storage deviceNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 2147US8822138B2Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ringSHINJO TETSUYA·Filed 2010·Granted Sep 2, 2014·0 cites·13 claims
- 2246US10067423B2Additive and resist underlayer film-forming composition containing the sameNISSAN CHEMICAL IND LTD·Filed 2015·Granted Sep 4, 2018·0 cites·10 claims
- 2345US10289002B2Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymerNISSAN CHEMICAL IND LTD·Filed 2014·Granted May 14, 2019·0 cites·12 claims
- 2445US8916327B2Underlayer coating forming composition containing dextrin ester compoundTAKEI SATOSHI·Filed 2004·Granted Dec 23, 2014·1 cites·10 claims
- 2544US11131928B2Resist underlayer film forming composition which contains compound having glycoluril skeleton as additiveNISSAN CHEMICAL CORP·Filed 2017·Granted Sep 28, 2021·0 cites·14 claims
- 2644US10113083B2Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compoundNISSAN CHEMICAL IND LTD·Filed 2014·Granted Oct 30, 2018·0 cites·12 claims
- 2741US9753369B2Polymer-containing developerSAKAMOTO RIKIMARU·Filed 2012·Granted Sep 5, 2017·0 cites·14 claims
- 2841US2021028463A1Undercoat layer-forming composition for energy storage deviceNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 2941US2021020952A1Undercoat layer-forming composition for energy storage deviceNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 3038US10025191B2Polymer-containing coating liquid applied to resist patternNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jul 17, 2018·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →