Inventor · disambiguated record
Yasushi Sonoda
Also filed as: SONODA YASUSHI
10 granted patents·6 pending applications·12 citations·filing 2015–2022
80Inventor score
Files withHITACHI HIGH TECH CORP16
Top patents by PatentIndex Score
16 records- 0177US12094781B2Manufacturing method of three-dimensional semiconductor deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Sep 17, 2024·2 cites·4 claims
- 0277USD1008986SIon shield plate for plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2021·Granted Dec 26, 2023·7 cites·1 claims
- 0376US11776792B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Oct 3, 2023·1 cites·4 claims
- 0465US11355319B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 7, 2022·1 cites·9 claims
- 0561US10699909B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Jun 30, 2020·1 cites·6 claims
- 0654US2025239437A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 0752US2025299928A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 0850US12442455B2Gas supply apparatus, vacuum processing apparatus, and gas supply methodHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 14, 2025·0 cites·8 claims
- 0947US2024194489A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2021·Application pending·0 cites
- 1046US2024194450A1Plasma processing device and plasma processing methodHITACHI HIGH TECH CORP·Filed 2021·Application pending·0 cites
- 1144US2022319809A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 1243US11387110B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 12, 2022·0 cites·12 claims
- 1339US12347656B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Jul 1, 2025·0 cites·6 claims
- 1439US11232932B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Jan 25, 2022·0 cites·4 claims
- 1536US2018277402A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Application pending·0 cites
- 1635US10522333B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Dec 31, 2019·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →