Inventor · disambiguated record
Yasuyuki Unno
Also filed as: UNNO YASUYUKI
31 granted patents·5 pending applications·799 citations·filing 1991–2023
97Inventor score
Top patents by PatentIndex Score
36 records- 0195US5459000AImage projection method and device manufacturing method using the image projection methodCANON KK·Filed 1993·Granted Oct 17, 1995·114 cites·16 claims
- 0293US5933219AProjection exposure apparatus and device manufacturing method capable of controlling polarization directionCANON KK·Filed 1995·Granted Aug 3, 1999·116 cites·22 claims
- 0392US6301001B1Optical element manufacturing system, an illumination system, and an exposure apparatusCANON KK·Filed 2000·Granted Oct 9, 2001·51 cites·7 claims
- 0491US9360423B2Optical system for a holographic microscope including a spatial filterYU CHUNG-CHIEH·Filed 2012·Granted Jun 7, 2016·13 cites·14 claims
- 0590US5805273AProjection exposure apparatus and microdevice manufacturing methodCANON KK·Filed 1995·Granted Sep 8, 1998·115 cites·24 claims
- 0688US5184176AProjection exposure apparatus with an aberration compensation device of a projection lensCANON KK·Filed 1991·Granted Feb 2, 1993·66 cites·11 claims
- 0784US9091614B2Wavefront optical measuring apparatusOHKUBO AKINORI·Filed 2011·Granted Jul 28, 2015·7 cites·14 claims
- 0884US7508598B2Apparatus for measuring aerial images produced by an optical lithography systemCANON KK·Filed 2006·Granted Mar 24, 2009·7 cites·14 claims
- 0984US6829041B2Projection optical system and projection exposure apparatus having the sameCANON KK·Filed 2000·Granted Dec 7, 2004·21 cites·26 claims
- 1082US8896840B2Interferometric method and digital holographic microscopeMATSUBARA ISAO·Filed 2012·Granted Nov 25, 2014·4 cites·8 claims
- 1179US5995285AMultilevel optical diffraction device with antireflection film and exposure apparatusCANON KK·Filed 1997·Granted Nov 30, 1999·45 cites·18 claims
- 1277US5953106AProjection optical system, exposure apparatus and semiconductor-device manufacturing method using the systemCANON KK·Filed 1997·Granted Sep 14, 1999·41 cites·56 claims
- 1374US6077631APhotomask and scanning exposure apparatus and device manufacturing method using sameCANON KK·Filed 1998·Granted Jun 20, 2000·29 cites·45 claims
- 1473US6476869B1Image processing system and method using system characteristic and image informationCANON KK·Filed 1994·Granted Nov 5, 2002·33 cites·32 claims
- 1573US6327086B1Optical diffraction device and exposure apparatusCANON KK·Filed 1999·Granted Dec 4, 2001·29 cites·40 claims
- 1673US5872617AScanning type exposure apparatus and device manufacturing methodCANON KK·Filed 1996·Granted Feb 16, 1999·29 cites·33 claims
- 1770US6641985B2Method for making elementCANON KK·Filed 1999·Granted Nov 4, 2003·32 cites·17 claims
- 1869US9170171B2Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording mediumCANON KK·Filed 2013·Granted Oct 27, 2015·2 cites·8 claims
- 1968US6120950AOptical element manufacturing methodCANON KK·Filed 1997·Granted Sep 19, 2000·28 cites·11 claims
- 2064US12326668B2Detection apparatus, lithography apparatus, and article manufacturing methodCANON KK·Filed 2022·Granted Jun 10, 2025·0 cites·11 claims
- 2164US7102828B2Optical element and manufacturing method thereofCANON KK·Filed 2001·Granted Sep 5, 2006·4 cites·5 claims
- 2258US12098913B2Detector that detects relative positions of marks while blocking non-interference lightCANON KK·Filed 2021·Granted Sep 24, 2024·0 cites·15 claims
- 2358US8531747B2Hologram, hologram data generation method, and exposure apparatusMATSUBARA ISAO·Filed 2009·Granted Sep 10, 2013·2 cites·16 claims
- 2457US2024027921A1Detection device, lithography apparatus, and article manufacturing methodCANON KK·Filed 2023·Application pending·0 cites
- 2554US7262920B2Optical element and manufacturing method thereforCANON KK·Filed 2003·Granted Aug 28, 2007·3 cites·7 claims
- 2649US9347853B2Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording mediumCANON KK·Filed 2013·Granted May 24, 2016·0 cites·16 claims
- 2747US2015130922A1Objective optical system and image acquisition apparatusCANON KK·Filed 2014·Application pending·0 cites
- 2845US10777440B2Detection device, imprint apparatus, planarization device, detection method, and article manufacturing methodCANON KK·Filed 2019·Granted Sep 15, 2020·0 cites·19 claims
- 2945US2009116694A1Device for measuring an aerial image produced by an optical lithography systemCANON KK·Filed 2007·Application pending·0 cites
- 3044US8314938B2Method and apparatus for measuring surface profile of an objectOHKUBO AKINORI·Filed 2010·Granted Nov 20, 2012·0 cites·16 claims
- 3144US7911709B2Apparatus and method for improving detected resolution and/or intensity of a sampled imageCANON KK·Filed 2005·Granted Mar 22, 2011·0 cites·55 claims
- 3242US8432530B2Device, method, and system for measuring image profiles produced by an optical lithography systemUNNO YASUYUKI·Filed 2008·Granted Apr 30, 2013·0 cites·34 claims
- 3341US2004263814A1Projection optical system and projection exposure apparatus having the sameCANON KK·Filed 2003·Application pending·0 cites
- 3439US5706077AScan type projection exposure apparatus and microdevice manufacturing method using the sameCANON KK·Filed 1995·Granted Jan 6, 1998·8 cites·12 claims
- 3537US2011222041A1Apparatus, method, and lithography systemCANON KK·Filed 2010·Application pending·0 cites
- 3636US9116303B2Hologram with cells to control phase in two polarization directions and exposure apparatusMATSUBARA ISAO·Filed 2010·Granted Aug 25, 2015·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →