Inventor · disambiguated record
Yasutsugu Usami
Also filed as: MORIOKA HIROSHI · USAMI YASUTSUGU
47 granted patents·4 pending applications·1,488 citations·filing 1992–2014
99Inventor score
Files withHITACHI LTD42HITACHI HIGH TECH CORP3IWABUCHI YUKO2SAMSUNG ELECTRONICS CO LTD2WATANABE MASAHIRO1
Top patents by PatentIndex Score
51 records- 0199US7692144B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2007·Granted Apr 6, 2010·42 cites·15 claims
- 0299US6172363B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 1997·Granted Jan 9, 2001·185 cites·20 claims
- 0399US6107637AElectron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 1998·Granted Aug 22, 2000·147 cites·34 claims
- 0497US6329826B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2000·Granted Dec 11, 2001·95 cites·4 claims
- 0596US7417444B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2005·Granted Aug 26, 2008·25 cites·7 claims
- 0696US6388747B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2001·Granted May 14, 2002·62 cites·2 claims
- 0796US6333510B1Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2000·Granted Dec 25, 2001·44 cites·12 claims
- 0895US7329889B2Electron beam apparatus and method with surface height calculator and a dual projection optical unitHITACHI LTD·Filed 2005·Granted Feb 12, 2008·17 cites·6 claims
- 0995US6797954B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2003·Granted Sep 28, 2004·42 cites·7 claims
- 1095US6759655B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2001·Granted Jul 6, 2004·74 cites·4 claims
- 1195US6635873B1Scanning electron microscope with voltage applied to the sampleHITACHI LTD·Filed 2000·Granted Oct 21, 2003·45 cites·9 claims
- 1295US6310341B1Projecting type charged particle microscope and projecting type substrate inspection systemHITACHI LTD·Filed 1999·Granted Oct 30, 2001·108 cites·27 claims
- 1394US8212227B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusWATANABE MASAHIRO·Filed 2010·Granted Jul 3, 2012·12 cites·10 claims
- 1494US6753518B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2001·Granted Jun 22, 2004·35 cites·17 claims
- 1593US6348690B1Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 1998·Granted Feb 19, 2002·51 cites·30 claims
- 1692US6919577B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2004·Granted Jul 19, 2005·25 cites·17 claims
- 1791US6493082B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2002·Granted Dec 10, 2002·35 cites·4 claims
- 1890US7977632B2Scanning electron microscopeHITACHI LTD·Filed 2008·Granted Jul 12, 2011·8 cites·2 claims
- 1990US7952074B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2008·Granted May 31, 2011·8 cites·18 claims
- 2090US6979823B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2004·Granted Dec 27, 2005·21 cites·9 claims
- 2189US6476913B1Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 1999·Granted Nov 5, 2002·59 cites·11 claims
- 2288US6480279B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2001·Granted Nov 12, 2002·23 cites·2 claims
- 2387US7242015B2Patterned wafer inspection method and apparatus thereforHITACHI LTD·Filed 2005·Granted Jul 10, 2007·6 cites·21 claims
- 2487US7012252B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2005·Granted Mar 14, 2006·5 cites·12 claims
- 2587US6919564B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2002·Granted Jul 19, 2005·23 cites·1 claims
- 2686US6509564B1Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 1999·Granted Jan 21, 2003·39 cites·6 claims
- 2786US6087673AMethod of inspecting pattern and apparatus thereofHITACHI LTD·Filed 1998·Granted Jul 11, 2000·58 cites·29 claims
- 2885US6559663B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2001·Granted May 6, 2003·20 cites·10 claims
- 2985US6452178B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2001·Granted Sep 17, 2002·23 cites·16 claims
- 3084US7442923B2Scanning electron microscopeHITACHI LTD·Filed 2005·Granted Oct 28, 2008·5 cites·3 claims
- 3184US7026830B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2003·Granted Apr 11, 2006·19 cites·6 claims
- 3282US6903821B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2002·Granted Jun 7, 2005·15 cites·6 claims
- 3381US6236057B1Method of inspecting pattern and apparatus thereof with a differential brightness image detectionHITACHI LTD·Filed 2000·Granted May 22, 2001·15 cites·23 claims
- 3480US7439506B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2007·Granted Oct 21, 2008·3 cites·30 claims
- 3574US6512227B2Method and apparatus for inspecting patterns of a semiconductor device with an electron beamHITACHI LTD·Filed 2001·Granted Jan 28, 2003·10 cites·17 claims
- 3673US6768113B2Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 2002·Granted Jul 27, 2004·7 cites·2 claims
- 3773US6376854B2Method of inspecting a pattern on a substrateHITACHI LTD·Filed 2001·Granted Apr 23, 2002·8 cites·10 claims
- 3871US6987265B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2002·Granted Jan 17, 2006·9 cites·12 claims
- 3971US5478195AProcess and apparatus for transferring an object and for processing semiconductor wafersHITACHI LTD·Filed 1992·Granted Dec 26, 1995·48 cites·6 claims
- 4070US6504609B2Inspection method, apparatus and system for circuit patternHITACHI LTD·Filed 2002·Granted Jan 7, 2003·7 cites·2 claims
- 4160US8134125B2Method and apparatus of an inspection system using an electron beamIWABUCHI YUKO·Filed 2008·Granted Mar 13, 2012·0 cites·18 claims
- 4259US7232996B2Method and an apparatus of an inspection system using an electron beamHITACHI LTD·Filed 2005·Granted Jun 19, 2007·0 cites·12 claims
- 4357US8604430B2Method and an apparatus of an inspection system using an electron beamIWABUCHI YUKO·Filed 2012·Granted Dec 10, 2013·0 cites·6 claims
- 4452US9159528B2Electron beam apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Oct 13, 2015·0 cites·20 claims
- 4551US7038767B2Three-dimensional micropattern profile measuring system and methodHITACHI HIGH TECH CORP·Filed 2002·Granted May 2, 2006·3 cites·4 claims
- 4650US2014361164A1Electron beam inspection apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 4749US6894790B2Micropattern shape measuring system and methodHITACHI HIGH TECH CORP·Filed 2002·Granted May 17, 2005·2 cites·4 claims
- 4847US7130063B2Micropattern shape measuring system and methodHITACHI HIGH TECH CORP·Filed 2005·Granted Oct 31, 2006·0 cites·6 claims
- 4946US2004036021A1Scanning electron microscopeHITACHI LTD·Filed 2003·Application pending·0 cites
- 5044US2003111616A1Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application methodHITACHI LTD·Filed 2002·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →